3,5-Bis[4-(2-hydroxypropan-2-yl)phenyl]heptan-4-one

• 分子结构分类: 有机化合物 - 木脂素、新木脂素和相关化合物
• 英文名称: 3,5-Bis[4-(2-hydroxypropan-2-yl)phenyl]heptan-4-one
• 英文别名: 3,5-bis[4-(2-hydroxypropan-2-yl)phenyl]heptan-4-one
• 化学式: C₂₅H₃₄O₃
• 分子量: 382.5
• InChiKey: GAOBZIBJLHDZJY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  28
• 可旋转键数：
  8
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.48
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  3

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2743249A1

  公开（公告）日：2014-06-18

  The present invention provides a cyclic compound having a molecular weight of 500 to 5000 and represented by the following formula (1), a method for producing the cyclic compound, a composition containing the cyclic compound, and a method for forming a resist pattern using the composition: wherein at least one of R0 is a monovalent group containing an iodine atom.

  本发明提供了一种分子量在 500 至 5000 之间并由下式（1）表示的环状化合物、一种生产该环状化合物的方法、一种含有该环状化合物的组合物以及一种使用该组合物形成抗蚀剂图案的方法： 其中 R0 至少有一个是含有碘原子的单价基团。
• RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYPHENOL COMPOUND USED THEREIN, AND ALCOHOL COMPOUND CAPABLE OF BEING DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2743769A1

  公开（公告）日：2014-06-18

  The present invention provides a resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom. wherein R1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms; R2 are each independently a hydrogen atom, a halogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group and may be the same or different on the same naphthalene ring; at least one of R2 is a hydroxyl group; n is an integer of 1 to 4; the structural formulas of the repeating units in the formulas (1) and (2) may be the same or different; in the general formula (1), m1 are each independently an integer of 1 to 7; and in the general formula (2), X are each independently an oxygen atom or a sulfur atom, and m2 are each independently an integer of 1 to 6.

  本发明提供了一种含有通式（1）或（2）所代表的化合物的抗蚀剂组合物、一种使用该组合物形成抗蚀剂图案的方法、一种用于该组合物的多酚化合物，以及一种可从该组合物中提取的醇类化合物。 其中 R1 各自独立地为单键或具有 1 至 30 个碳原子的 2n 价烃基，其中烃基可以是环烃基、双键、杂原子或具有 6 至 30 个碳原子的芳香基；R2 各自独立地为氢原子、卤素原子、具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基或羟基，在同一萘环上可以相同或不同；R2中至少有一个是羟基； n是1至4的整数；式（1）和式（2）中重复单元的结构式可以相同或不同；通式（1）中，m1各自独立地是1至7的整数；通式（2）中，X各自独立地是氧原子或硫原子，m2各自独立地是1至6的整数。
• RESIST COMPOSITION
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2911002A1

  公开（公告）日：2015-08-26

  A resist composition of the present invention is a resist composition containing a resist base material and a solvent. The resist base material contains a specific stereoisomer. A content of the specific stereoisomer in the resist base material is 50 to 100% by mass.

  本发明的抗蚀剂组合物是一种含有抗蚀剂基料和溶剂的抗蚀剂组合物。光刻胶基料含有特定的立体异构体。光刻胶基料中特定立体异构体的含量为 50%至 100%（按质量计）。