A photoresist composition for forming an insulation film which comprises (A) an alkali-soluble resin, (B) a qunonediazidosulfonic acid ester and (C) a thermosetting component, and can provide a film having a shape whose side faces are inclined in a skirt form which shape is suitable for an insulating film for an organic electroluminescence element; an insulating film for an organic electroluminescence element having roundish upper edge portions which is prepared by forming a resist film on a substrate using the photoresist composition and then subjecting the resist film to a heat treatment; and a method for forming an insulating film on a substrate by the photolithography which comprises using the photoresist composition.
一种用于形成绝缘膜的光刻胶组合物,该组合物由(A)碱溶性
树脂、(B)qunonediazidosulfonic acid ester 和(C)热固性成分组成,可提供一种薄膜,该薄膜的侧面呈倾斜的裙形,其形状适用于有机电致发光元件的绝缘膜;一种用于有机电致发光元件的绝缘膜,其上边缘部分呈圆形,其制备方法是使用光刻胶组合物在基底上形成抗蚀膜,然后对抗蚀膜进行热处理;以及一种通过光刻技术在基底上形成绝缘膜的方法,其中包括使用光刻胶组合物。