Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same
申请人:Masubuchi Takashi
公开号:US20110177453A1
公开(公告)日:2011-07-21
According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity.
In the formula, Z represents a substituted or unsubstituted C
1
-C
6
straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C
1
-C
6
straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C
1
-C
3
alkyl or fluorine-containing alkyl group; and Q
+
represents a sulfonium cation or an iodonium cation.
根据本发明,提供了一种可聚合的含氟磺酸盐聚合物,其化学式为(2),以及通过其聚合获得的树脂。使用本发明的磺酸盐树脂,可以提供具有高分辨率、深度焦点容忍度(DOF)、小线边粗糙度(LER)和高灵敏度的抗蚀剂组合物。在该公式中,Z表示取代或未取代的C1-C6直链或支链烷基,或者是由环烷烃或芳香族碳氢化合物中消除两个氢原子而得到的取代或未取代的C1-C6直链或支链烷基序列键合到二价基团中的一个二价基团;R表示氢原子、卤素原子或C1-C3烷基或含氟烷基;Q+表示磺酸盐阳离子或碘酸盐阳离子。