申请人:Allen Robert David
公开号:US20080233517A1
公开(公告)日:2008-09-25
The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
本发明提供了在负型光刻胶组成中有用的聚合物。本发明的聚合物包含(1)具有极性官能团的第一单体;(2)第二单体;以及可选地,(3)赋予至少一种特性的第三单体,所述特性从可交联功能、蚀刻抗性和溶解度调节中选择。第一单体在极性官能团消除时提供酸催化极性转换,而第二单体提供水溶解性。本发明的聚合物可以被纳入负型光刻胶组成中,该组成物还可以包括光酸发生剂、交联剂、碱性化合物、溶剂、溶解加速剂、光碱发生剂、潜在碱性化合物、表面活性剂、粘附剂和抗泡剂。