SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20160200877A1
公开(公告)日:2016-07-14
The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1). There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate.
本发明提供了一种含有硅骨架的聚合物化合物,其含有由通式(1)所示的重复单元。可以提供一种适用于化学增强负型光阻组合物的基础树脂的含有硅骨架的聚合物化合物,可以解决在金属布线(如Cu和Al)、电极和基板(特别是在SiN基板上)上产生的剥离问题,并且可以在图案底部和基板上不产生污点和足底轮廓的情况下形成细小的图案。