PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHY PLATE AND METHOD FOR PRODUCING LITHOGRAPHY PLATE
申请人:Konica Minolta Medical & Graphic, Inc.
公开号:EP1630603A1
公开(公告)日:2006-03-01
Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.
本发明公开了一种光敏组合物,该组合物包含具有可进行自由基聚合的基团的化合物 A、具有可进行阳离子聚合的基团的化合物 B、光聚合引发剂 C 和聚合物粘合剂 D,该光敏组合物的特征在于,光聚合引发剂 C 包含铁烯烃络合物和含卤代烷基的化合物。
Photosensitive composition, photosensitive lithography plate and method for producing lithography plate
申请人:Matsumura Toshiyuki
公开号:US20070020555A1
公开(公告)日:2007-01-25
Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.
US7285375B2
申请人:——
公开号:US7285375B2
公开(公告)日:2007-10-23
Bruining, Recueil des Travaux Chimiques des Pays-Bas, 1922, vol. 41, p. 664