3-Hydroxymethyl-2,4,7-trioxaoctan | 41633-62-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 3-Hydroxymethyl-2,4,7-trioxaoctan
• 英文别名: 2-methoxy-2-(2-methoxy-ethoxy)-ethanol；2-Methoxy-2-(2-methoxyethoxy)ethanol
• CAS: 41633-62-9
• 化学式: C₆H₁₄O₄
• 分子量: 150.175
• InChiKey: GWNQFTALOUBBGK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.7
• 重原子数：
  10
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  47.9
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  乙二醇甲醚 在 四乙基硝酸铵 作用下， 生成 3-Hydroxymethyl-2,4,7-trioxaoctan 、 2,4,6,9-Tetraoxadecan 、 2-Hydroxyaethyl-2'-methoxyaethylformal
  参考文献：
  名称：

  Anodic oxidations. IX. Anodic oxidation of 2-methoxyethanol

  摘要：

  DOI：

  10.1021/ja00788a017

文献信息

• Photoresist base material, method for purification thereof, and photoresist compositions
  申请人：Ueda Mitsuru

  公开号：US20050271971A1

  公开（公告）日：2005-12-08

  A photoresist base material comprising an extreme ultra-violet reactive organic compound of the following formula (1), wherein A is a central structure that is an aliphatic group having 1 to 50 carbon atoms, an aromatic group having 6 to 50 carbon atoms, an organic group containing these together or an organic group having a cyclic structure formed by repetition of these, each of B to D is an extreme ultra-violet reactive group, a group having reactivity to the action of a chromophore active to extreme ultra-violet, or a C 1 to C 50 aliphatic group, C 6 to C 50 aromatic group, an organic group containing these together or a substituent having a branched structure, containing such a reactive group, X to Z are single bonds or ether bonds, l to n are integers of 0 to 5 satisfying l+m+n>1, and A to D may contain a substituent having a heteroatom. The photoresist base material and a composition thereof enable ultrafine processing based on extreme ultra-violet.

  一种光刻底材料，包括以下式子（1）的极紫外反应有机化合物，其中A是一个中心结构，为具有1到50个碳原子的脂肪族基团，具有6到50个碳原子的芳香族基团，包含这些基团的有机基团或由这些基团重复形成的环状结构的有机基团，B到D中的每一个是极紫外反应基团，具有对极紫外活性色团作用的反应性基团，或C1到C50脂肪族基团，C6到C50芳香族基团，包含这些基团的有机基团或具有支链结构的取代基，含有这样的反应性基团，X到Z是单键或乙醚键，l到n是0到5的整数，满足l+m+n>1，且A到D可以含有一个含有杂原子的取代基。该光刻底材料及其组合物能够实现基于极紫外的超细加工。
• Synthetic derivative of paraherquamide
  申请人：Merck & Co., Inc.

  公开号：EP0354615A1

  公开（公告）日：1990-02-14

  There are disclosed synthetic derivatives of the natural product paraherquamide. The synthetic derivatives are prepared by reactions at the parahe­quamide A, B, E, F and G rings, that is at carbon atoms 14 to 16, the lactam ring and carbon atoms 24 to 26 as well as carbon atoms 5 and 12. The compounds are active antiparasitic agents and compositions for that use are also disclosed.

  本文公开了天然产物对喹酰胺的合成衍生物。这些合成衍生物是通过对喹酰胺 A、B、E、F 和 G 环（即碳原子 14 至 16、内酰胺环和碳原子 24 至 26 以及碳原子 5 和 12）上的反应制备的。这些化合物是活性抗寄生虫剂，其用途组合物也已公开。
• PHOTORESIST BASE MATERIAL, METHOD FOR PURIFICATION THEREOF, AND PHOTORESIST COMPOSITIONS
  申请人：IDEMITSU KOSAN CO., LTD.

  公开号：EP1553451A1

  公开（公告）日：2005-07-13

  A photoresist base material comprising an extreme ultra-violet reactive organic compound of the following formula (1),    wherein A is a central structure that is an aliphatic group having 1 to 50 carbon atoms, an aromatic group having 6 to 50 carbon atoms, an organic group containing these together or an organic group having a cyclic structure formed by repetition of these, each of B to D is an extreme ultra-violet reactive group, a group having reactivity to the action of a chromophore active to extreme ultra-violet, or a C1 to C50 aliphatic group, C6 to C50 aromatic group, an organic group containing these together or a substituent having a branched structure, containing such a reactive group, X to Z are single bonds or ether bonds, l to n are integers of 0 to 5 satisfying l + m + n ≥ 1, and A to D may contain a substituent having a heteroatom. The photoresist base material and a composition thereof enable ultrafine processing based on extreme ultra-violet.

  一种光致抗蚀剂基底材料，包含下式(1)的极紫外活性有机化合物、 其中 A 是一个中心结构，它是一个具有 1 至 50 个碳原子的脂肪族基团、一个具有 6 至 50 个碳原子的芳香族基团、一个包含这些基团的有机基团或一个具有由这些基团重复形成的环状结构的有机基团；B 至 D 各为一个极紫外反应基团，一个对极紫外活性发色团的作用具有反应性的基团、或 C1 至 C50 脂肪族基团、C6 至 C50 芳香族基团、一起含有这些基团的有机基团或具有支链结构的取代基，其中含有这样的活性基团，X 至 Z 为单键或醚键，l 至 n 为 0 至 5 的整数，满足 l + m + n ≥ 1，A 至 D 可含有具有杂原子的取代基。光刻胶基底材料及其组合物可以实现基于极紫外线的超精细加工。
• CALIXRESORCINARENE COMPOUNDS, PHOTORESIST BASE MATERIALS, AND COMPOSITIONS THEREOF
  申请人：IDEMITSU KOSAN CO., LTD.

  公开号：EP1734032A1

  公开（公告）日：2006-12-20

  A calixresorcinarene compound shown by the following formula (1), wherein R individually represents a hydrogen atom, a 1-tetrahydropyranyl group, a 1-tetrahydrofuranyl group, or one or more organic groups selected from the group consisting of the organic groups shown by the following formulas, wherein n individually represents an integer of 1 to 50, provided that a compound in which R is selected only from a hydrogen atom, a 1-tetrahydropyranyl group, and a 1-tetrahydrofiiranyl group is excluded.

  下式(1)所示的钙络合萘化合物、 其中 R 分别代表氢原子、1-四氢吡喃基、1-四氢呋喃基或一个或多个有机基团，这些有机基团选自下式所示的有机基团、 其中 n 单个代表 1 至 50 的整数，但不包括 R 仅选自氢原子、1-四氢吡喃基和 1-四氢菲喃基的化合物。
• Calixresorcinarene compounds, photoresist base materials, and compositions thereof
  申请人：Ishii Hirotoshi

  公开号：US20070190451A1

  公开（公告）日：2007-08-16

  A calixresorcinarene compound shown by the following formula (1), wherein R individually represents a hydrogen atom, a 1-tetrahydropyranyl group, a 1-tetrahydrofuranyl group, or one or more organic groups selected from the group consisting of the organic groups shown by the following formulas, wherein n individually represents an integer of 1 to 50, provided that a compound in which R is selected only from a hydrogen atom, a 1-tetrahydropyranyl group, and a 1-tetrahydrofuranyl group is excluded.