TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION
申请人:Fukumoto Takashi
公开号:US20090029290A1
公开(公告)日:2009-01-29
(1) A polymer compound for photoresist composition which is high in dissolution rate in a developing solution after exposure and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided. Furthermore, (3) a photoresist composition containing the subject polymer compound is provided. In detail, a tertiary alcohol derivative represented by the following general formula (1) is provided.
(In the formula, R
1
and R
2
are taken together to form a ring together with a carbon atom to which R
1
and R
2
are bonded, and R
1
and R
2
as taken represent a linear, branched or cyclic alkylene group having from 2 to 9 carbon atoms, which may contain an oxygen atom at an arbitrary position; R
3
represents a hydrogen atom or a methyl group; w represents a linear, branched or cyclic alkylene group having from 1 to 10 carbon atoms; and n represents 0 or 1.)