接口广告
摩熵化学
数据开放平台 数据库官网
小程序
打开微信扫一扫
首页 分子通 化学资讯 化学百科 反应查询 关于我们
请输入关键词

5'-(1,4-Dioxaspiro[4.5]decan-2-yl)tetrahydrospiro[cyclohexane-1,2'-furo[2,3-d][1,3]dioxol]-6'-ol

中文名称
——
中文别名
——
英文名称
5'-(1,4-Dioxaspiro[4.5]decan-2-yl)tetrahydrospiro[cyclohexane-1,2'-furo[2,3-d][1,3]dioxol]-6'-ol
英文别名
5-(1,4-dioxaspiro[4.5]decan-3-yl)spiro[3a,5,6,6a-tetrahydrofuro[2,3-d][1,3]dioxole-2,1'-cyclohexane]-6-ol
5'-(1,4-Dioxaspiro[4.5]decan-2-yl)tetrahydrospiro[cyclohexane-1,2'-furo[2,3-d][1,3]dioxol]-6'-ol化学式
CAS
——
化学式
C18H28O6
mdl
——
分子量
340.417
InChiKey
XEYVZLZWQFLSDZ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2
  • 重原子数:
    24
  • 可旋转键数:
    1
  • 环数:
    5.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    66.4
  • 氢给体数:
    1
  • 氢受体数:
    6

反应信息

点击查看最新优质反应信息

文献信息

  • PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
    申请人:KODAMA Kunihiko
    公开号:US20080138742A1
    公开(公告)日:2008-06-12
    The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
    本发明涉及一种在阳离子部分具有多环碳氢结构的芳基磺酸盐化合物。
  • Positive photosensitive composition and method of forming pattern using the same
    申请人:Takahashi Hyou
    公开号:US20070172761A1
    公开(公告)日:2007-07-26
    A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xa 1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A 1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa 2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A 2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.
  • POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUNDS FOR USE IN THE POSITIVE PHOTOSENSITIVE COMPOSITION, MANUFACTURING METHOD OF THE POLYMER COMPOUNDS, COMPOUNDS FOR USE IN THE MANUFACTURE OF THE POLYMER COMPOUNDS, AND PATTERN-FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION
    申请人:SHIBUYA Akinori
    公开号:US20080085464A1
    公开(公告)日:2008-04-10
    A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.
  • POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUND USED FOR THE POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF THE POLYMER COMPOUND, AND PATTERN FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION
    申请人:SHIBUYA Akinori
    公开号:US20080187863A1
    公开(公告)日:2008-08-07
    A polymer compound having a structure represented by the formula (1) as defined herein at a main chain terminal, and a positive photosensitive composition containing a polymer compound having a structure represented by the following formula (1) as defined herein at a main chain terminal and a photoacid generator capable of generating an acid upon irradiation with actinic rays or radiation
  • PHOTOSENSITIVE COMPOSITION, COMPOUND USED FOR PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING PHOTOSENSITIVE COMPOSITION
    申请人:KODAMA Kunihiko
    公开号:US20080220371A1
    公开(公告)日:2008-09-11
    A photosensitive composition comprises: (A) a compound capable of generating an acid represented by formula (I) upon irradiation with actinic ray or radiation; and (B) a resin that decomposes by the action of an acid to its increase solubility in an alkali developer wherein Ra represents an alkyl group substituted with a fluorine atom, or an aryl group substituted with a fluorine atom or a group having a fluorine atom; Rb represents an alkyl group not substituted with a fluorine atom on α-position of the alkyl group, or an aryl group not substituted with a fluorine atom or a group having a fluorine atom.
查看更多