Dimethylcyclopentylcarbinol-methylaether | 3275-02-3

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: Dimethylcyclopentylcarbinol-methylaether
• 英文别名: 2-Methoxypropan-2-ylcyclopentane
• CAS: 3275-02-3
• 化学式: C₉H₁₈O
• 分子量: 142.241
• InChiKey: CWKXDMQMRFZIBA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  重氮甲烷 、 溴代环戊烷 、 丙酮 生成 Dimethylcyclopentylcarbinol-methylaether
  参考文献：
  名称：

  Hueckel,W.; Gupte,S.K., Justus Liebigs Annalen der Chemie, 1965, vol. 685, p. 105 - 117

  摘要：

  DOI：

文献信息

• Compounds and methods for the targeted degradation of enhancer of zeste homolog 2 polypeptide
  申请人：ARVINAS OPERATIONS, INC.

  公开号：US11191741B2

  公开（公告）日：2021-12-07

  The present disclosure relates to bifunctional compounds, which find utility as modulators of enhancer of zeste homolog 2 (target protein). In particular, the present disclosure is directed to bifunctional compounds, which contain on one end a Von Hippel-Lindau, cereblon, Inhibitors of Apotosis Proteins or mouse double-minute homolog 2 ligand which binds to the respective E3 ubiquitin ligase and on the other end a moiety which binds the target protein, such that the target protein is placed in proximity to the ubiquitin ligase to effect degradation (and inhibition) of target protein. The present disclosure exhibits a broad range of pharmacological activities associated with degradation/inhibition of target protein. Diseases or disorders that result from aggregation or accumulation of the target protein are treated or prevented with compounds and compositions of the present disclosure.

  本公开涉及双功能化合物，它们可用作泽斯特同源增强子 2（靶蛋白）的调节剂。特别是，本公开涉及双功能化合物，其一端含有与相应 E3 泛素连接酶结合的 Von Hippel-Lindau、cereblon、抑制细胞凋亡蛋白或小鼠双敏同源物 2 配体，另一端含有与靶蛋白结合的分子，从而使靶蛋白靠近泛素连接酶，以实现对靶蛋白的降解（和抑制）。本公开物具有与降解/抑制靶蛋白相关的广泛药理活性。本公开的化合物和组合物可以治疗或预防因目标蛋白聚集或积聚而导致的疾病或失调。
• RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE
  申请人：Watanabe Takeru

  公开号：US20110195362A1

  公开（公告）日：2011-08-11

  There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.
• US8835092B2
  申请人：——

  公开号：US8835092B2

  公开（公告）日：2014-09-16
• Hueckel,W.; Gupte,S.K., Justus Liebigs Annalen der Chemie, 1965, vol. 685, p. 105 - 117
  作者：Hueckel,W.、Gupte,S.K.

  DOI：——

  日期：——