4-(5',6'-dihydroxy-1',3',4',9a'-tetrahydrospiro[cyclohexane-1,9'-xanthen]-4a'(2'H)-yl)benzene-1,2,3-triol

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 黄酮类化合物
• 英文名称: 4-(5',6'-dihydroxy-1',3',4',9a'-tetrahydrospiro[cyclohexane-1,9'-xanthen]-4a'(2'H)-yl)benzene-1,2,3-triol
• 英文别名: 4-(5,6-dihydroxyspiro[2,3,4,9a-tetrahydro-1H-xanthene-9,1'-cyclohexane]-4a-yl)benzene-1,2,3-triol
• 化学式: C₂₄H₂₈O₆
• 分子量: 412.483
• InChiKey: CMIFNKWYNSYEJE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.4
• 重原子数：
  30
• 可旋转键数：
  1
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  110
• 氢给体数：
  5
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  环己酮 、 邻苯三酚 在 对甲苯磺酸 作用下， 以 氯仿 为溶剂， 以49%的产率得到4-(5',6'-dihydroxy-1',3',4',9a'-tetrahydrospiro[cyclohexane-1,9'-xanthen]-4a'(2'H)-yl)benzene-1,2,3-triol
  参考文献：
  名称：

  Reactions of resorcinols with ketones

  摘要：

  New products of the condensation of resorcinols with ketones under conditions of mild acid catalysis were studied.

  DOI：

  10.1070/mc2003v013n04abeh001687

文献信息

• CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200209739A1

  公开（公告）日：2020-07-02

  A chemically amplified photosensitive composition which forms a resist pattern whose cross-sectional shape is rectangular, and which has a wide depth of focus margin; a photosensitive dry film having a photosensitive layer made from the composition; a method of manufacturing a patterned-resist film using the composition; a method of manufacturing a substrate with a template using the composition; a method of manufacturing a plated article using the substrate with a template; and a novel compound. An acid diffusion suppressing agent having a specific structure is blended into the composition including an acid generator which generates acid upon exposure to an irradiated active ray or radiation.

  一种化学增感光敏组合物，形成一个截面形状为矩形的抗蚀图案，具有宽广的焦深度余量；一种具有由该组合物制成的感光层的感光干膜；使用该组合物制造图案抗蚀膜的方法；使用该组合物制造带有模板的基板的方法；使用带有模板的基板制造电镀物品的方法；以及一种新型化合物。酸扩散抑制剂与包括在暴露于辐射活性光线或辐射时生成酸的酸发生剂的组合物中混合，具有特定的结构。
• Photosensitive compositions and applications thereof
  申请人：PROMERUS, LLC

  公开号：US11537045B2

  公开（公告）日：2022-12-27

  The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain multifunctional crosslinking agents, and two or more phenolic compounds which are resistant to thermo-oxidative chain degradation and exhibit improved mechanical properties.

  本发明涉及含有聚降冰片烯（PNB）聚合物和某些添加剂的光敏组合物，这些组合物可用于形成微电子和/或光电器件及其组件，更具体地说，本发明涉及包含 PNB 和某些多功能交联剂以及两种或两种以上酚类化合物的组合物，这些组合物可抗热氧化链降解，并具有更好的机械性能。
• POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP1644426B1

  公开（公告）日：2009-06-17
• PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF
  申请人：PROMERUS, LLC

  公开号：US20210116807A1

  公开（公告）日：2021-04-22

  The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain multifunctional crosslinking agents, and two or more phenolic compounds which are resistant to thermo-oxidative chain degradation and exhibit improved mechanical properties.
• US7462436B2
  申请人：——

  公开号：US7462436B2

  公开（公告）日：2008-12-09