申请人:——
公开号:US20020169266A1
公开(公告)日:2002-11-14
A photoresist polymeric compound includes a monomer unit represented by following Formula (I):
1
The polymeric compound may further include at least one of monomer units represented by following Formulae (IIa) to
2
wherein R
1
, R
13
, R
14
and R
15
are each a hydrogen atom or methyl group; R
2
and R
3
are each a hydrocarbon group having from 1 to 8 carbon atoms; R
4
, R
5
and R
6
are each a hydrogen atom, hydroxyl group or a methyl group; R
7
and R
8
are each a hydrogen atom, hydroxyl group or —COOR
9
group, where R
9
is a t-butyl group, 2-tetrahydropyranyl group, etc.; R
10
and R
11
are each a hydrogen atom, hydroxyl group or oxo group; R
12
is a hydrocarbon group having a tertiary carbon atom at a bonding site with an oxygen atom indicated in the formula; R
16
is a t-butyl group, 2-tetrahydropyranyl group, etc.; and n denotes an integer from 1 to 3.
The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.
一种光阻聚合物化合物包括以下式(I)所表示的单体单元:1该聚合物化合物还可以包括以下式(IIa)至(IIb)所表示的至少一种单体单元中的至少一种:其中,R1、R13、R14和R15均为氢原子或甲基基团;R2和R3均为具有1至8个碳原子的碳氢基团;R4、R5和R6均为氢原子、羟基或甲基基团;R7和R8均为氢原子、羟基或-COOR9基团,其中R9为叔丁基基团、2-四氢呋喃基团等;R10和R11均为氢原子、羟基或酮基;R12为具有在公式中指示的氧原子与三级碳原子成键位的碳氢基团;R16为叔丁基基团、2-四氢呋喃基团等;n表示1至3的整数。该光阻聚合物化合物可以表现出对基材的高粘附性,并可以高精度地形成细小图案。