1,2-di(1,4-dioxaspiro[4.5]decan-2-yl)ethane-1,2-diol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1,2-di(1,4-dioxaspiro[4.5]decan-2-yl)ethane-1,2-diol
• 英文别名: (1S,2S)-1,2-bis[(2R)-1,4-dioxaspiro[4.5]decan-2-yl]ethane-1,2-diol；1,2-bis(1,4-dioxaspiro[4.5]decan-3-yl)ethane-1,2-diol
• 化学式: C₁₈H₃₀O₆
• 分子量: 342.433
• InChiKey: DFWHMBZZFDLOTN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  24
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  77.4
• 氢给体数：
  2
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  ferrocene boronic acid 、 1,2-di(1,4-dioxaspiro[4.5]decan-2-yl)ethane-1,2-diol 以 乙醚 为溶剂， 反应 2.0h， 以70%的产率得到
  参考文献：
  名称：

  基于碳水化合物的二茂铁硼酸酯：合成、表征、晶体结构和抗菌活性

  摘要：

  通过二茂铁硼酸与衍生自 D-木糖、L-山梨糖和 D-甘露醇的受保护糖二醇反应，设计并高效合成了一套基于碳水化合物支架的二茂铁硼酸酯。这些化合物鉴定为 1,2-O-isopropidene-α-D-xylofuranose-3,5-ferrocenyl boronate (3a), 1,2-O-cyclohexylidene-α-D-xylofuranose-3,5-ferrocenyl boronate (3b) ), 1-O-benzyl-2,3-O-isopropylidene-α-L-sorbofuranose-4,6-ferrocenyl boronate (3c), 1,2:5,6-di-O-isopropylidene-D-mannitol- 3,4-二茂铁硼酸酯 (3d) 和 1,2:5,6-二-O-亚环己基-D-甘露醇-3,4-二茂铁硼酸酯 (3e) 分离为空气和湿气稳定的

  DOI：

  10.1002/ejic.201300773

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD
  申请人：Fujii Kana

  公开号：US20120003586A1

  公开（公告）日：2012-01-05

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R 1 and R 11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R 12 represents a phenyl group which may have a substituent.

  提供了一种光致射线敏感或辐射敏感的树脂组合物；使用该组合物的光刻膜；以及一种图案形成方法。该光致射线敏感或辐射敏感的树脂组合物包括（A）一种树脂，能够通过酸的作用增加在碱性显影剂中的溶解度，该树脂含有由式（I）表示的重复单元、由式（II）表示的重复单元和由式（III）表示的重复单元；和（B）一种化合物，能够在光致射线或辐射照射下产生含氟酸基的酸：其中，R1和R11各自独立地表示氢原子或可能具有取代基的烷基，而R12表示可能具有取代基的苯基。
• MANNITOL BASED GELATORS FOR OIL SPILLAGE APPLICATIONS
  申请人：Hindustan Petroleum Corporation Ltd.

  公开号：EP3307736B1

  公开（公告）日：2021-04-14
• US8541161B2
  申请人：——

  公开号：US8541161B2

  公开（公告）日：2013-09-24
• US8741044B1
  申请人：——

  公开号：US8741044B1

  公开（公告）日：2014-06-03
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AU RAYONNEMENT, FILM DE RESIST L'UTILISANT ET PROCÉDÉ DE FORMATION D'UN MOTIF
  申请人：FUJIFILM CORP

  公开号：WO2010110472A1

  公开（公告）日：2010-09-30

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R1 and R11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R12 represents a phenyl group which may have a substituent.