1,1,1,3,3,3-Hexafluor-2-methoxy-propanol-(2) | 662-16-8

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1,1,1,3,3,3-Hexafluor-2-methoxy-propanol-(2)
• 英文别名: 2-Methoxy-1,1,1,3,3,3-hexafluorpropan-2-ol；2-Hydroxy-2-methoxy-hexafluoraceton；β,β,β,β',β',β'-Hexafluor-α-methoxy-isopropanol；Hexafluoraceton-Methanol-Addukt；1,1,1,3,3,3-hexafluoro-2-methoxy-propan-2-ol；Hexafluoraceton-monomethylketal；1,1,1,3,3,3-Hexafluoro-2-methoxy-2-propanol；1,1,1,3,3,3-hexafluoro-2-methoxypropan-2-ol
• CAS: 662-16-8
• 化学式: C₄H₄F₆O₂
• 分子量: 198.065
• InChiKey: FEKJGFZZVNCSRO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  29.5
• 氢给体数：
  1
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  重氮甲烷 、 1,1,1,3,3,3-Hexafluor-2-methoxy-propanol-(2) 以 乙醚 为溶剂， 生成 六氟丙酮二甲缩酮
  参考文献：
  名称：

  Fluorinated ketones

  摘要：

  DOI：

  10.1007/bf00910798
• 作为产物：
  描述：

  原乙酸三甲酯 、 六氟丙酮 生成 1,1,1,3,3,3-Hexafluor-2-methoxy-propanol-(2)
  参考文献：
  名称：

  Reaction of Hexafluoroacetone with Ortho Esters

  摘要：

  DOI：

  10.1021/jo01349a081

文献信息

• Monomer having fluorine-containing acetalor ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same
  申请人：Maeda Katsumi

  公开号：US20050164119A1

  公开（公告）日：2005-07-28

  As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1): wherein R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R 1 and R 2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R 3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.

  本发明提供了一种透明度改善的聚合物，适用于化学放大型光刻胶中使用的抗性树脂，可用于在180纳米或更短波长的曝光光下进行光刻。该聚合物包括由具有聚合活性的单体聚合得到的重复单元，其中该单体具有由通式（1）表示的含氟缩醛或缩酮结构： 其中，R表示含有聚合活性的碳碳双键的原子基团；R1和R2中至少一个是具有1至20个碳原子的含氟烷基或含氟芳基；R3表示从氢原子、烷基、烷氧基取代的烷基、含氟烷基、芳基、含氟芳基、芳基烷基和含氟芳基烷基等基团中选择的一个基团。
• Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same
  申请人：NEC Corporation

  公开号：US07232639B2

  公开（公告）日：2007-06-19

  As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1): wherein R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1 and R2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.

  本发明提供了一种透明度提高的聚合物，适用于化学放大型光刻胶中的抗性树脂，可用于使用180纳米或更短的曝光光进行光刻。该聚合物包括由具有聚合活性的单体聚合而成的重复单元，其中该单体具有由通式（1）表示的含氟缩醛或缩酮结构：其中R表示含有聚合活性的碳碳双键的原子团；R1和R2中至少有一个是具有1至20个碳原子的氟化烷基或氟化芳基；R3表示从氢原子、烷基、烷氧基取代的烷基、氟化烷基、芳基、氟化芳基、芳基烷基和氟化芳基烷基等组成的基团中选出的一个基团。
• Petrov,K.A. et al., Journal of Organic Chemistry USSR (English Translation), 1977, vol. 13, # 5, p. 866 - 870
  作者：Petrov,K.A. et al.

  DOI：——

  日期：——
• Reactions of Hexafluoroacetone and Orthoformates
  作者：R. A. Braun

  DOI：10.1021/jo01342a038

  日期：1966.4
• Fluorinated ketones
  作者：I. L. Knunyants、Ch'en Ch'ing-yun、N. P. Gambaryan

  DOI：10.1007/bf00910798

  日期：1960.4