Resist materials sensitive to actinic radiation are formed from an acid generator and a material sensitive to acid. The acid from the acid generator interacts with the acid sensitive material to produce a change in solubility. Particularly useful acid generators included benzyl and naphthylmethyl sulfones.
                            抵抗感光辐射的材料是由酸发生剂和对酸敏感的材料形成的。酸发生剂中的酸与对酸敏感的材料相互作用,产生溶解度的变化。特别有用的酸发生剂包括苄基和
萘基甲基磺酮。