ACID-AMPLIFIER HAVING ACETAL GROUP AND PHOTORESIST COMPOSITION INCLUDING THE SAME
申请人:Lee Jung-Youl
公开号:US20090023093A1
公开(公告)日:2009-01-22
An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1.
in Formula 1, R is C
4
˜C
20
mono-cyclic or multi-cyclic saturated hydrocarbon, R
1
is C
1
˜C
10
linear hydrocarbon, C
1
˜C
10
perfluoro compound or C
5
˜C
20
aromatic compound, R
a
and R
b
are independently hydrogen atom or C
1
˜C
4
saturated hydrocarbon and A is independently oxygen atom (0) or sulfur atom (S).
US7935474B2
申请人:——
公开号:US7935474B2
公开(公告)日:2011-05-03
Acid-amplifier having acetal group, photoresist composition including the same and method for forming a photoresist pattern