ethylene glycol diisobutenyl ether | 849629-91-0

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: ethylene glycol diisobutenyl ether
• 英文别名: 2-Methyl-1-[2-(2-methylprop-1-enoxy)ethoxy]prop-1-ene
• CAS: 849629-91-0
• 化学式: C₁₀H₁₈O₂
• 分子量: 170.252
• InChiKey: QBBUVWAAFRHWGQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.1
• 重原子数：
  12
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  乙二醇 、 异丁醛 在 盐酸 、 三乙胺 作用下， 以 甲苯 为溶剂， 反应 6.0h， 生成 ethylene glycol diisobutenyl ether
  参考文献：
  名称：

  WO2006/123701

  摘要：

  公开号：

文献信息

• Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate
  申请人：FUJIFILM Corporation

  公开号：EP2095947A1

  公开（公告）日：2009-09-02

  The invention provides a resin composition for laser engraving, having a binder polymer containing at least one of a structure unit represented by the following Formula (I) or a structure unit represented by the following Formula (II). In the Formulae, Q represents a partial structure which provides an acid group having an acid dissociation constant pKa of 0 to 20 when it is in the form of -Q-H; R1 to R3 each independently represent a hydrogen atom or a monovalent organic group; and A and B each independently represent a bivalent organic connecting group. The invention further provides a relief printing plate precursor having a relief forming layer containing the resin composition, a method for manufacturing a relief printing plate having crosslinking components of the relief forming layer and laser engraving the relief forming layer, and a relief printing plate formed thereby.

  本发明提供了一种用于激光雕刻的树脂组合物，其粘结剂聚合物含有下式（I）所代表的结构单元或下式（II）所代表的结构单元中的至少一种。在式中，Q 代表部分结构，当它以-Q-H 的形式存在时，可提供酸解离常数 pKa 为 0 至 20 的酸基；R1 至 R3 各自独立地代表氢原子或一价有机基团；A 和 B 各自独立地代表二价有机连接基团。本发明进一步提供了一种浮雕印刷板前体，该前体具有含有树脂组合物的浮雕形成层；一种制造浮雕印刷板的方法，该方法具有交联浮雕形成层的组分和激光雕刻浮雕形成层；以及由此形成的浮雕印刷板。
• WO2006/123700
  申请人：——

  公开号：——

  公开（公告）日：——
• PHOTORESIST COMPOSITION
  申请人：Matsuoka Hiroshi

  公开号：US20090035696A1

  公开（公告）日：2009-02-05

  Disclosed are a photoresist composition characterized by containing a polymer (A) containing a carboxyl group or a hydroxyl group, a polyfunctional alkenyl ether (B) represented by the general formula (I) below, and a photoacid generator (C) and the like. (In the formula, R 1 and R 2 may be the same as or different from each other and respectively represent a substituted or unsubstituted alkyl, a substituted or unsubstituted allyl, or a substituted or unsubstituted aralkyl, or alternatively R 1 and R 2 may form a substituted or unsubstituted alicyclic hydrocarbon ring together with an adjacent carbon atom; X represents a substituted or unsubstituted alkane from which n hydrogen atoms are removed; and n represents an integer of not less than 2.)
• US8822126B2
  申请人：——

  公开号：US8822126B2

  公开（公告）日：2014-09-02
• WO2006/123701
  申请人：——

  公开号：——

  公开（公告）日：——