The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the &ggr;-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.
本发明涉及一种能够控制溶解度的新型感光
树脂组合物和使用该组合物的双层结构图案形成方法,特别是涉及一种能够使用新型光聚合
引发剂和下层硬化剂控制&ggr;-值,并且即使在低曝光能量下也能根据曝光能量控制薄膜厚度而不会出现图案破裂的感光
树脂组合物。这种光敏
树脂组合物适用于彩色滤光片和液晶显示器(LCD)制造工艺中的涂层材料。