申请人:Konishiroku Photo Industry Co., Ltd.
公开号:US04837141A1
公开(公告)日:1989-06-06
A thermally developable light-sensitive material is disclosed that the said material has at least one light-sensitive silver halide containing layer on a support and which further contains a compound represented by the general formula (I): X (J.sub.m F).sub.n (I) wherein X is the residue of the development restrainer; J is a divalent linkage; F is an immobilizing group that is capable of reducing the diffusibility of the compound of formula (I) or a silver salt or silver complex thereof during thermal development; m is 0 or 1; and n is an integer of 1 to 3.
本发明揭示了一种热显影光敏材料,该材料在支撑体上至少具有一层含有光敏银卤化物的层,并且进一步包含由通式(I)表示的化合物:X(J.sub.m F).sub.n(I),其中X是显影抑制剂的残基;J是二价键链;F是一种能够减少通式(I)中化合物或其银盐或银络合物的扩散性的固定基团;m为0或1;n为1到3的整数。