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2-(2-甲氧基乙基)吗啉 | 959238-10-9

中文名称
2-(2-甲氧基乙基)吗啉
中文别名
——
英文名称
2-(2-methoxyethyl)morpholine
英文别名
——
2-(2-甲氧基乙基)吗啉化学式
CAS
959238-10-9
化学式
C7H15NO2
mdl
MFCD09864371
分子量
145.202
InChiKey
JNWROOKZZWOBBE-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    -0.3
  • 重原子数:
    10
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    30.5
  • 氢给体数:
    1
  • 氢受体数:
    3

安全信息

  • 海关编码:
    2934999090
  • WGK Germany:
    3

反应信息

  • 作为反应物:
    描述:
    2-(2-甲氧基乙基)吗啉 、 5-chloromethyl-3-iodo-6-methyl-4-(3,5-dimethylphenylsulfanyl)pyridin-2(1H)-one 在 potassium carbonate 作用下, 以 乙腈 为溶剂, 反应 1.0h, 以100 mg的产率得到4-(3,5-dimethylphenylsulfanyl)-3-iodo-5-[2-(2-methoxyethyl)morpholin-4-ylmethyl]-6-methylpyridin-2(1H)-one
    参考文献:
    名称:
    Synthesis and Biological Evaluation of C-5 Methyl Substituted 4-Arylthio and 4-Aryloxy-3-Iodopyridin-2(1H)-one Type Anti-HIV Agents
    摘要:
    A series of C-5 methyl substituted 4-arylthio- and 4-aryloxy-3-iodopyridin-2(1H)-ones hits been synthesized its new pyridinone analogues for their evaluation as anti-HIV inhibitors. The optimization at the 5-position wits developed through an efficient use of the key intermediates 5-ethoxycarbonyl- and 5-cyano-pyridin-2(1H)-ones (14 and 15). Biological studies revealed that several compounds show potent HIV-1 reverse transcriptase inhibitory properties, for example, compounds 93 and 99 are active at 0.6-50 nM against wild type HIV-1 and a panel of major simple/double HIV mutant strains.
    DOI:
    10.1021/jm900802y
  • 作为产物:
    描述:
    4-benzyl-2-(2-methoxyethyl)morpholine 在 palladium 10% on activated carbon 、 氢气 作用下, 以 甲醇 为溶剂, 40.0 ℃ 、300.01 kPa 条件下, 反应 3.0h, 以90%的产率得到2-(2-甲氧基乙基)吗啉
    参考文献:
    名称:
    Synthesis and Biological Evaluation of C-5 Methyl Substituted 4-Arylthio and 4-Aryloxy-3-Iodopyridin-2(1H)-one Type Anti-HIV Agents
    摘要:
    A series of C-5 methyl substituted 4-arylthio- and 4-aryloxy-3-iodopyridin-2(1H)-ones hits been synthesized its new pyridinone analogues for their evaluation as anti-HIV inhibitors. The optimization at the 5-position wits developed through an efficient use of the key intermediates 5-ethoxycarbonyl- and 5-cyano-pyridin-2(1H)-ones (14 and 15). Biological studies revealed that several compounds show potent HIV-1 reverse transcriptase inhibitory properties, for example, compounds 93 and 99 are active at 0.6-50 nM against wild type HIV-1 and a panel of major simple/double HIV mutant strains.
    DOI:
    10.1021/jm900802y
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文献信息

  • [EN] 1-ARYL-4-METHYL-[1,2,4]TRIAZOLO[4,3-a]QUINOXALINE DERIVATIVES<br/>[FR] DÉRIVÉS DE 1-ARYL-4-MÉTHYL-[1,2,4]TRIAZOLO[4,3-A]QUINOXALINE
    申请人:JANSSEN PHARMACEUTICA NV
    公开号:WO2013000924A1
    公开(公告)日:2013-01-03
    The present invention relates to novel l-aryl-4-methyl-[l,2,4]triazolo[4,3-a]- quinoxaline derivatives as inhibitors of phosphodiesterase 2 (PDE2) and to a lesser extent of phosphodiesterase 10 (PDE10) or as inhibitors of both, phosphodiesterases 2 and 10. The invention is also directed to pharmaceutical compositions comprising such compounds, to processes for preparing such compounds and compositions, and to the use of such compounds and compositions for the prevention and treatment of disorders in which PDE2 is involved, or disorders in which both PDE2 and PDE10 are involved, such as neurological and psychiatric disorders, and endocrinological or metabolic diseases. The present invention also relates to radiolabeled compounds which may be useful for imaging and quantifying the PDE2 enzyme in tissues, using positron- emission tomography (PET). The invention is also directed to compositions comprising such compounds, to processes for preparing such compounds and compositions, to the use of such compounds and compositions for imaging a tissue, cells or a host, in vitro or in vivo and to precursors of said compounds.
    本发明涉及新型的l-芳基-4-甲基-[1,2,4]三唑并[4,3-a]-喹喔啉衍生物,作为磷酸二酯酶2(PDE2)的抑制剂,以及在较小程度上作为磷酸二酯酶10(PDE10)的抑制剂或作为磷酸二酯酶2和10的双重抑制剂。该发明还涉及包含这类化合物的药物组合物,用于制备这类化合物和组合物的方法,以及将这类化合物和组合物用于预防和治疗涉及PDE2的疾病或涉及PDE2和PDE10的疾病,如神经和精神疾病,内分泌或代谢性疾病。本发明还涉及可能用于组织中PDE2酶的成像和定量的放射标记化合物,使用正电子发射断层扫描(PET)。该发明还涉及包含这类化合物的组合物,用于制备这类化合物和组合物的方法,将这类化合物和组合物用于体内或体外成像组织、细胞或宿主,并涉及这类化合物的前体。
  • Metal chemical mechanical planarization (CMP) composition and methods therefore
    申请人:Versum Materials US, LLC
    公开号:US10465096B2
    公开(公告)日:2019-11-05
    Provided are Chemical Mechanical Planarization (CMP) formulations that offer high and tunable Cu removal rates and low copper dishing for the broad or advanced node copper or Through Silica Via (TSV). The CMP compositions provide high selectivity of Cu film vs. other barrier layers, such as Ta, TaN, Ti, and TiN, and dielectric films, such as TEOS, low-k, and ultra low-k films. The CMP polishing formulations comprise water; abrasive; single chelator, dual chelators or tris chelators; morpholino family compounds as Cu dishing reducing agents. Additionally, organic quaternary ammonium salt, corrosion inhibitor, oxidizer, pH adjustor and biocide can be used in the formulations.
    所提供的化学机械平坦化(CMP)配方可为宽节点或先进节点铜或硅通孔(TSV)提供高且可调的铜去除率和低铜偏移。与其他阻挡层(如钽、钽镍、钛和钛镍)和介电薄膜(如 TEOS、低 K 和超低 K 薄膜)相比,CMP 组合物具有较高的铜膜选择性。CMP 抛光配方包括水;研磨剂;单螯合剂、双螯合剂或三螯合剂;作为铜排减剂的吗啉族化合物。此外,配方中还可使用有机季铵盐、缓蚀剂、氧化剂、pH 值调节剂和杀菌剂。
  • RIGID POLYURETHANE FOAMS
    申请人:IMPERIAL CHEMICAL INDUSTRIES PLC
    公开号:EP0935625A1
    公开(公告)日:1999-08-18
  • METHODS FOR TREATING DRUG RESISTANT CANCER
    申请人:Novartis AG
    公开号:EP1885187B1
    公开(公告)日:2013-09-25
  • Metal Chemical Mechanical Planarization (CMP) Composition And Methods Therefore
    申请人:Versum Materials US, LLC
    公开号:US20200032107A1
    公开(公告)日:2020-01-30
    Provided are Chemical Mechanical Planarization (CMP) formulations that offer high and tunable Cu removal rates and low copper dishing for the broad or advanced node copper or Through Silica Via (TSV). The CMP compositions provide high selectivity of Cu film vs. other barrier layers, such as Ta, TaN, Ti, and TiN, and dielectric films, such as TEOS, low-k, and ultra low-k films. The CMP polishing formulations comprise water; abrasive; single chelator, dual chelators or tris chelators; morpholino family compounds as Cu dishing reducing agents. Additionally, organic quaternary ammonium salt, corrosion inhibitor, oxidizer, pH adjustor and biocide can be used in the formulations.
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