COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND
申请人:TAKEMOTO Ichiki
公开号:US20100055609A1
公开(公告)日:2010-03-04
A compounds represented by the Formula (I) or the Formula (I′).
wherein Z
1
and Z
2
independently represent a hydrogen atom, a C
1
to C
12
alkyl group or a C
3
to C
12
cyclic saturated hydrocarbon group, provided that at least one of Z
1
and Z
2
represent a C
1
to C
12
alkyl group or a C
3
to C
12
cyclic saturated hydrocarbon group; rings Y
1
and Y
2
independently represents an optionally substituted C
3
to C
20
alicyclic hydrocarbon group; Q
1
to Q
4
and Q′1 to Q′4 independently represent a fluorine atom or a C
1
to C
6
perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
Compound, method for preparing the compound and resist composition containing the compound
申请人:Takemoto Ichiki
公开号:US08476473B2
公开(公告)日:2013-07-02
A compounds represented by the Formula (I) or the Formula (I′).
wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.