申请人:HOFFMANN LA ROCHE
公开号:WO2011131571A1
公开(公告)日:2011-10-27
The present invention relates to a compound of formula (I), wherein R1 is hydrogen, lower alkyl, lower alkyl substituted by halogen, benzyl, -C(0)-lower alkyl, -C(0)-CH2-lower alkoxy, -C(0)-C3-6-cycloalkyl, -(CH2)°-C(0)-NR,R', -(CH2)°S(0)2- lower alkyl or -S(0)2-NR,R'; o is 0 or 1; R,R' are independently from each other hydrogen or lower alkyl, or may form together with the N atom to which they are attached a 5 or 6 membered heterocycloalkyl ring; R2 is hydrogen or lower alkyl; R3 is halogen, lower alkoxy, lower alkyl substituted by halogen or lower alkoxy substituted by halogen; and may be the same or different in case n is 2; n is 1 or 2; Ar is phenyl optionally substituted by one or two substituents selected from lower alkyl, halogen, lower alkoxy, lower alkyl substituted by hydroxy or cyano, or is a five or six membered heteroaryl group, selected from thiophenyl or pyridinyl which are optionally substituted by lower alkyl or halogen; or to a pharmaceutically active acid addition salt. It has surprisingly been found that the compounds of formula I show a high affinity simultaneously to both the NK1 and the NK3 receptors (dual NK1/NK3 receptor antagonists), useful in the treatment of schizophrenia.
本发明涉及一种具有以下结构的化合物(I),其中R1是氢、较低烷基、被卤素取代的较低烷基、苄基、-C(0)-较低烷基、-C(0)-CH2-较低烷氧基、-C(0)-C3-6-环烷基、-(CH2)°-C(0)-NR,R'、-(CH2)°S(0)2-较低烷基或-S(0)2-NR,R';o为0或1;R,R'分别独立地为氢或较低烷基,或者与它们附着的N原子一起形成5或6元杂环烷基环;R2为氢或较低烷基;R3为卤素、较低烷氧基、被卤素取代的较低烷基或被卤素取代的较低烷氧基;在n为2时可能相同或不同;n为1或2;Ar为苯基,可选择地取代为来自较低烷基、卤素、较低烷氧基、被羟基或氰基取代的较低烷基的一个或两个取代基,或者是来自噻吩基或吡啶基的五元或六元杂环芳基,可选择地被较低烷基或卤素取代;或者是药理活性酸盐。令人惊讶的是,发现化合物I具有高亲和力,同时对NK1和NK3受体(双重NK1/NK3受体拮抗剂)表现出高亲和力,可用于治疗精神分裂症。