4-ethoxy carbonyl-1-(2,6-dichloro-4-trifluoromethyl-phenyl)-2-pyridone | 115551-51-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-ethoxy carbonyl-1-(2,6-dichloro-4-trifluoromethyl-phenyl)-2-pyridone
• 英文别名: ethyl 1-[2,6-dichloro-4-(trifluoromethyl)phenyl]-2-oxopyridine-4-carboxylate
• CAS: 115551-51-4
• 化学式: C₁₅H₁₀Cl₂F₃NO₃
• 分子量: 380.151
• InChiKey: YYKIBTBFBMTJSC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  24
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  46.6
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  锂硼氢 、 4-ethoxy carbonyl-1-(2,6-dichloro-4-trifluoromethyl-phenyl)-2-pyridone 在 4-ethoxy carbonyl-1-2,6 dichloro-4-trifluoromethylphenyl 、 水 、 乙酸乙酯 、 Brine 、 magnesium sulfate 、 Compound 13 作用下， 以 四氢呋喃 为溶剂， 反应 2.0h， 以to give 4-hydroxymethyl-1-(2,6-dichloro-4-trifluoromethyl-phenyl)-2-pyridone as a brown gum (9.2 g) (Compound 13)的产率得到4-hydroxymethyl-1-(2,6-dichloro-4-trifluoromethyl-phenyl)-2-pyridone
  参考文献：
  名称：

  Phenyl pyrid(-one or-thione) compounds which are intermediates

  摘要：

  化合物的式(I) ##STR1## 其中R^1、R^2、R^4和R^5独立选择自氢、卤素、低碳基（可选择卤素替代）、低烷氧基（可选择卤素替代）和低烯基（可选择卤素替代）；R^3为卤素、氨基、单（或二）（低）烷基氨基、低碳基（可选择卤素替代）、低烷氧基（可选择卤素替代）和低烯基（可选择卤素替代），但要求R^3不是单氯甲基或单溴甲基；R^6为氧或硫；R^7和R^10独立选择自氢、卤素、低碳基（可选择卤素替代）、低烷氧基（可选择卤素替代）和低硫代烷氧基（可选择卤素替代）；R^8为氢、卤素、可选择替代的低碳基、可选择替代的低烷氧基、可选择替代的低硫代烷氧基、氰基、硝基、可选择替代的肟基、可选择替代的低烯基、可选择替代的芳氧基、可选择替代的氨基或S(O)nR^11，其中n为0、1或2，R^11为可选择替代的低碳基；R^9为氢或可选择卤素替代的低碳基、可选择卤素替代的低烯基或CO2R^12，其中R^12为可选择卤素替代的低碳基；但要求R^1、R^2、R^3、R^4和R^5不全为氢；而且当R^3为三氟甲基且R^1和R^5为卤素时，R^2和R^4不同时为氢，或R^7、R^8、R^9和R^10不包含一到四个卤素或三卤甲基取代基。

  公开号：

  US05039807A1

文献信息

• Phenyl pyridones and insectidal use thereof
  申请人：Imperial Chemical Industries PLC

  公开号：US04866078A1

  公开（公告）日：1989-09-12

  A compound of formula (I) ##STR1## wherein R.sup.1, R.sup.2, R.sup.4 and R.sup.5 are independently selected from hydrogen, halogen, lower alkyl optionally substituted by halogen, lower alkoxy optionally substituted by halogen and lower alkenyl optionally substituted by halogen; R.sup.3 is halogen, amino, mono- or di(lower alkyl)-amino, lower alkyl substituted by halogen, lower alkoxy optionally substituted by halogen and lower alkenyl optionally substituted by halogen provided that R.sup.3 is not monochloro or monobromo-methyl; R.sup.6 is oxygen or sulphur; R.sup.7 and R.sup.10 are independently selected from hydrogen, halogen, lower alkyl optionally substituted by halogen, lower alkoxy optionally substituted by halogen, and lower thioalkoxy optionally substituted by halogen; and R.sup.8 is hydrogen, halogen, optionally substituted lower alkyl, optionally substituted lower alkoxy, optionally substituted lower thioalkoxy, cyano, nitro, optionally substituted oximino, optionally substituted lower alkenyl, optionally substituted aryloxy, optionally substituted amino or S(O)nR.sup.11 wherein n is 0, 1 or 2 and R.sup.11 is optionally substituted lower alkyl; R.sup.9 is hydrogen, or lower alkyl optionally substituted by halogen, lower alkenyl optionally substituted by halogen or CO.sub.2 R.sup.12 wherein R.sup.12 is lower alkyl optionally substituted by halogen; provided that R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are not all hydrogen; and further provided that when R.sup.3 is trifluoromethyl and R.sup.1 and R.sup.5 are halogen, R.sup.2 and R.sup.4 are not both hydrogen, or R.sup.7, R.sup.8, R.sup.9 and R.sup.10 do not comprise from one to four halogen or trihalomethyl substituents.

  化合物的式(I) ##STR1## 其中，R.sup.1、R.sup.2、R.sup.4和R.sup.5是独立选择的氢、卤素、低碳基（可选择卤素取代）、低氧基（可选择卤素取代）和低烯基（可选择卤素取代）；R.sup.3是卤素、氨基、一级或二级（低碳基）氨基、低碳基（可选择卤素取代）、低氧基（可选择卤素取代）和低烯基（可选择卤素取代），但R.sup.3不是单氯甲基或单溴甲基；R.sup.6是氧或硫；R.sup.7和R.sup.10是独立选择的氢、卤素、低碳基（可选择卤素取代）、低氧基（可选择卤素取代）和低硫氧基（可选择卤素取代）；R.sup.8是氢、卤素、可选择取代的低碳基、可选择取代的低氧基、可选择取代的低硫氧基、氰基、硝基、可选择取代的肟基、可选择取代的低烯基、可选择取代的芳氧基、可选择取代的氨基或S（O）nR.sup.11，其中n为0、1或2，R.sup.11是可选择取代的低碳基；R.sup.9是氢，或者是可选择卤素取代的低碳基、可选择卤素取代的低烯基或CO.sub.2R.sup.12，其中R.sup.12是可选择卤素取代的低碳基；但是，R.sup.1、R.sup.2、R.sup.3、R.sup.4和R.sup.5不全为氢；并且当R.sup.3为三氟甲基且R.sup.1和R.sup.5为卤素时，R.sup.2和R.sup.4不全为氢，或者R.sup.7、R.sup.8、R.sup.9和R.sup.10不包括一到四个卤素或三卤甲基取代基。
• US4866078A
  申请人：——

  公开号：US4866078A

  公开（公告）日：1989-09-12
• US5039807A
  申请人：——

  公开号：US5039807A

  公开（公告）日：1991-08-13
• Phenyl pyrid(-one or-thione) compounds which are intermediates
  申请人：Imperial Chemical Industries PLC

  公开号：US05039807A1

  公开（公告）日：1991-08-13

  A compound of formula (I) ##STR1## wherein R.sup.1, R.sup.2, R.sup.4 and R.sup.5 are independently selected from hydrogen, halogen, lower alkyl optionally substituted by halogen, lower alkoxy optionally substituted by halogen and lower alkenyl optionally substituted by halogen; R.sup.3 is halogen, amino, mono- or di(lower alkyl)-amino, lower alkyl substituted by halogen, lower alkoxy optionally substituted by halogen and lower alkenyl optionally substituted by halogen provided that R.sup.3 is not monochloro or monobromo-methyl; R.sup.6 is oxygen or sulphur; R.sup.7 and R.sup.10 are independently selected from hydrogen, halogen, lower alkyl optionally substituted by halogen, lower alkoxy optionally substituted by halogen, and lower thioalkoxy optionally substituted by halogen; and R.sup.8 is hydrogen, halogen, optionally substituted lower alkyl, optionally substituted lower alkoxy, optionally substituted lower thioalkoxy, cyano, nitro, optionally substituted oximino, optionally substituted lower alkenyl, optionally substituted aryloxy, optionally substituted amino or S(O)nR.sup.11 wherein n is 0, 1 or 2 and R.sup.11 is optionally substituted lower alkyl; R.sup.9 is hydrogen, or lower alkyl optionally substituted by halogen, lower alkenyl optionally substituted by halogen or CO.sub.2 R.sup.12 wherein R.sup.12 is lower alkyl optionally substituted by halogen; provided that R.sup.1, R.sup.2 R.sup.3, R.sup.4 and R.sup.5 are not all hydrogen; and further provided that when R.sup.3 is trifluoromethyl and R.sup.1 and R.sup.5 are halogen, R.sup.2 and R.sup.4 are not both hydrogen, or R.sup.7, R.sup.8, R.sup.9 and R.sup.10 do not comprise from one to four halogen or trihalomethyl substitutents.

  化合物的式(I) ##STR1## 其中R^1、R^2、R^4和R^5独立选择自氢、卤素、低碳基（可选择卤素替代）、低烷氧基（可选择卤素替代）和低烯基（可选择卤素替代）；R^3为卤素、氨基、单（或二）（低）烷基氨基、低碳基（可选择卤素替代）、低烷氧基（可选择卤素替代）和低烯基（可选择卤素替代），但要求R^3不是单氯甲基或单溴甲基；R^6为氧或硫；R^7和R^10独立选择自氢、卤素、低碳基（可选择卤素替代）、低烷氧基（可选择卤素替代）和低硫代烷氧基（可选择卤素替代）；R^8为氢、卤素、可选择替代的低碳基、可选择替代的低烷氧基、可选择替代的低硫代烷氧基、氰基、硝基、可选择替代的肟基、可选择替代的低烯基、可选择替代的芳氧基、可选择替代的氨基或S(O)nR^11，其中n为0、1或2，R^11为可选择替代的低碳基；R^9为氢或可选择卤素替代的低碳基、可选择卤素替代的低烯基或CO2R^12，其中R^12为可选择卤素替代的低碳基；但要求R^1、R^2、R^3、R^4和R^5不全为氢；而且当R^3为三氟甲基且R^1和R^5为卤素时，R^2和R^4不同时为氢，或R^7、R^8、R^9和R^10不包含一到四个卤素或三卤甲基取代基。