A permanent photoresist composition comprising: (A) one or more bisphenol A-novolac epoxy resins according to Formula I; wherein each group R in Formula I is individually selected from glycidyl or hydrogen and k in Formula I is a real number ranging from 0 to about 30; (B) one or more epoxy resins selected from the group represented by Formulas BIIa and BIIb; wherein each R
1
, R
2
and R
3
in Formula BIIa are independently selected from the group consisting of hydrogen or alkyl groups having 1 to 4 carbon atoms and the value of p in Formula BIIa is a real number ranging from 1 to 30; the values of n and m in Formula BIIb are independently real numbers ranging from 1 to 30 and each R
4
and R
5
in Formula BIIb are independently selected from hydrogen, alkyl groups having 1 to 4 carbon atoms, or trifluoromethyl; (C) one or more cationic photoinitiators (also known as photoacid generators or PAGs); and (D) one or more solvents.
一种永久性光致抗蚀剂组合物,包括: (A) 一种或多种符合式 I 的双
酚 A-
新戊二醇环氧
树脂;其中式 I 中的每个基团 R 单独选自
缩水甘油基或氢,式 I 中的 k 为 0 至约 30 的实数; (B) 一种或多种选自式 BIIa 和 BIIb 所代表的组的环氧
树脂;其中每个 R
1
, R
2
和 R
3
在式 BIIa 中独立地选自氢或具有 1 至 4 个碳原子的烷基组成的组,且式 BIIa 中 p 的值为 1 至 30 的实数;式 BIIb 中 n 和 m 的值独立地为 1 至 30 的实数,且每个 R
4
和 R
5
独立选自氢、具有 1 至 4 个碳原子的烷基或三
氟甲基; (C) 一种或多种阳离子光
引发剂(也称为光酸发生剂或 PAG);以及 (D) 一种或多种溶剂。