申请人:Kao Corporation
公开号:US20150111383A1
公开(公告)日:2015-04-23
A polishing liquid composition for a silicon wafer, wherein the composition comprises silica particles (component A), at least one kind of nitrogen-containing basic compound (component B) selected from an amine compound and an ammonium compound, and a water-soluble macromolecular compound (component C) that contains 10 wt % or more of a constitutional unit I represented by a general formula (1) below and has a weight average molecular weight of 50,000 or more and 1,500,000 or less; and the pH at 25° C. is 8.0 to 12.0. In the general formula (1), R
1
and R
2
each independently represents a hydrogen, a C1 to C8 alkyl group, or a C1 to C2 hydroxyalkyl group, and R
1
and R
2
are never both hydrogens.
一种用于硅晶片的抛光液组合物,其中该组合物包括二氧化硅颗粒(组分A),至少一种含氮碱性化合物(组分B)选自胺化合物和铵化合物,以及一种水溶性高分子化合物(组分C),该高分子化合物包含10重量%或更多的由下式(1)表示的结构单元I,并且具有50,000或更多且1,500,000或更少的重均分子量;在25°C时的pH值为8.0至12.0。在式(1)中,R1和R2分别独立表示氢、C1至C8烷基或C1至C2羟基烷基,并且R1和R2永远不是两个氢原子。