Photosensitive resin composition, dry film, and workpiece using the same
申请人:Mitsui Chemicals, Inc.
公开号:US20030176528A1
公开(公告)日:2003-09-18
A photosensitive resin composition which contains (A) polyamic acid, (B) (meth)acrylate having at least two photopolymerizable C═C unsaturated double bonds, (C) a photopolymerization initiator and (D) a flame retardant, with the (meth)acrylate (B) having at least two photopolymerizable C═C unsaturated double bonds being contained in an amount of 10 to 700 parts by weight based on 100 parts by weight of the polyamic acid (A).