methyl 2,2-difluoro-3-(methacryloyloxy)pentanoate | 1245609-08-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: methyl 2,2-difluoro-3-(methacryloyloxy)pentanoate
• 英文别名: methyl 2,2-difluoro-3-(2-methylprop-2-enoyloxy)pentanoate
• CAS: 1245609-08-8
• 化学式: C₁₀H₁₄F₂O₄
• 分子量: 236.216
• InChiKey: OWFDVHMWRICDFY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  16
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  1-ethoxycarbonyl-1,1-difluoro-2-butyl methacrylate 在 N,N-dimethylamino-pyridine 作用下， 以 甲醇 、 正己烷 为溶剂， 以95%的产率得到methyl 2,2-difluoro-3-(methacryloyloxy)pentanoate
  参考文献：
  名称：

  RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND

  摘要：

  一种辐射敏感树脂组合物包括第一聚合物，其中包括酸敏感基团，酸发生剂用于在辐射照射后生成酸，以及第二聚合物，其中包括氟原子和由通用公式（x）表示的功能基团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。R1代表碱性易裂解基团。A代表氧原子，-NR′—，-CO—O—#或-SO2—O—##，其中A代表的氧原子不是直接与芳香环、酰基或亚砜基结合的氧原子，R′代表氢原子或碱性易裂解基团，“#”和“##”表示与R1结合的键合手。-A-R1(x)

  公开号：

  US20120237875A1

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20210356862A1

  公开（公告）日：2021-11-18

  An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin. M 1 + A − -L-B − M 2 + (I)

  一种感光射线或辐射敏感的树脂组合物，包括通式（I）所表示的化合物和可酸分解树脂。M1+A−-L-B−M2+（I）
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND METHOD OF CONTROLLING ACID DIFFUSION
  申请人：JSR CORPORATION

  公开号：US20200393755A1

  公开（公告）日：2020-12-17

  The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar 1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar 1 ; and R G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.

  这种辐射敏感的树脂组合物包含：具有包含酸敏感基团的结构单元的聚合物；以及由公式（1）表示的化合物。在公式（1）中，Ar1代表从具有6到30个碳原子的芳香族化合物的芳香环中去除（m + n + 2）个氢原子得到的基团; -OH和-COO-在Ar1的同一苯环上的邻位上彼此结合; RG代表由公式（V-1）表示的基团，由公式（V-2）表示的基团，包括内酯结构的基团，包括环状碳酸酯结构的基团，包括磺酸酯结构的基团，包括酮基的羰基基团，包括硫代碳酸酯基团或包括由公式（V-3）表示的基团的基团，或类似的基团。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130022912A1

  公开（公告）日：2013-01-24

  A radiation-sensitive resin composition includes a first polymer having a structural unit represented by a following formula (1), and a radiation-sensitive acid generator. R C in the formula (1) preferably represents an aliphatic polycyclic hydrocarbon group having a valency of (n+1) and having 4 to 30 carbon atoms. The structural unit represented by the formula (1) is preferably a structural unit represented by a n following formula (1-1).

  一种辐射敏感的树脂组合物，包括具有以下公式（1）所代表的结构单元的第一聚合物和辐射敏感的酸发生剂。在公式（1）中，RC最好代表具有(n+1)价且具有4至30个碳原子的脂肪族多环烃基团。公式（1）所代表的结构单元最好是由以下公式（1-1）所代表的n的结构单元。
• RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20130288179A1

  公开（公告）日：2013-10-31

  A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R 1 and R 4 each independently represent a hydrogen atom, or the like. R 2 and R 3 each independently represent a hydrogen atom or the like. X 1 and X 2 each independently represent a hydrogen atom, or the like, or X 1 and X 2 taken together represent —S—, —O—, —SO 2 —, or the like. A represents an ethanediyl group, wherein at least one hydrogen atom included in X 1 , X 2 and A is substituted by —Y—SO 3 − M + . Y represents an alkanediyl group having 1 to 10 carbon atoms, or the like. M + represents a monovalent onium cation. In the case where —Y—SO 3 − M + is present in a plurality of number, a plurality of Ys are each identical or different and a plurality of M + s are each identical or different.

  一种辐射敏感的树脂组合物，包括由式（1）表示的化合物和包括具有酸敏感基团的结构单元的聚合物。其中，R1和R4各自独立地表示氢原子等。R2和R3各自独立地表示氢原子等。X1和X2各自独立地表示氢原子等，或X1和X2一起表示-S-、-O-、-SO2-等。A表示乙二酰基基团，其中X1、X2和A中包含的至少一个氢原子被-Y-SO3-M+取代。Y表示具有1到10个碳原子的脂肪二基基团等。M+表示一价的离子型阳离子。在-Y-SO3-M+存在多个的情况下，多个Y可以相同或不同，多个M+可以相同或不同。
• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
  申请人：JSR Corporation

  公开号：US20130216951A1

  公开（公告）日：2013-08-22

  A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R 1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R 2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.

  一种辐射敏感的树脂组合物，包括聚合物、产生酸的剂和有机溶剂。聚合物包括从公式（1）表示的化合物衍生的第一结构单元和从公式（2）表示的化合物衍生的第二结构单元。R1代表具有价数为（a+2）的有机基团，该有机基团与构成内酯环的碳原子一起形成具有3到8个碳原子的环结构。R2代表氟原子、羟基、具有1到20个碳原子的有机基团或类似物。