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6-(3,6,7,10,11-Pentapentoxytriphenylen-2-yl)oxyhexyl acetate | 111689-39-5

中文名称
——
中文别名
——
英文名称
6-(3,6,7,10,11-Pentapentoxytriphenylen-2-yl)oxyhexyl acetate
英文别名
——
6-(3,6,7,10,11-Pentapentoxytriphenylen-2-yl)oxyhexyl acetate化学式
CAS
111689-39-5
化学式
C51H76O8
mdl
——
分子量
817.16
InChiKey
PMLKMWCCMHFQQE-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    847.4±65.0 °C(Predicted)
  • 密度:
    1.040±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    15
  • 重原子数:
    59
  • 可旋转键数:
    34
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.63
  • 拓扑面积:
    81.7
  • 氢给体数:
    0
  • 氢受体数:
    8

上下游信息

  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

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文献信息

  • Use of Methanofullerne Derivatives as Resist Materials and Method for Forming a Resist Layer
    申请人:Robinson Alex
    公开号:US20080118874A1
    公开(公告)日:2008-05-22
    The use as a resist material of a methanofullerene derivative having a plurality of open-ended addends, and to a method for forming a patterned resist layer on a substrate using the methanofullerene derivatives. The methanofullerene derivatives can be represented by the formal C 2x (CR 1 R 2 ) m where x is at least 10, m is at least 2, each addend represented by CR 1 R 2 is the same or different, and wherein each R 1 and R 2 is each a monovalent organic group, or a divalent organic group which forms a ring structure by being joined to the fullerene shell, or where both R 1 and R 2 of an addend are divalent groups, they may be mutually joined to form a ring structure, save that at least two of R 1 or two of R 2 are monovalent, or a mixture of such derivatives. The use of any methanofullerene derivative which has been chemically amplified for formation of a patterned resist layer. The essential step of the method is forming a coating layer comprising the methanofullerene derivative on the substrate surface, the methanofullerene derivative being chemically amplified by including in the coating layer at least one additional component which increases the sensitivity of the exposed layer to actinic radiation which is subsequently used to pattern the layer.
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