2-(2-(2-methyl-2-adamantyloxy)-2-oxoethoxy)-2-oxoethyl methacrylate | 1136072-07-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 肽模拟物
• 英文名称: 2-(2-(2-methyl-2-adamantyloxy)-2-oxoethoxy)-2-oxoethyl methacrylate
• 英文别名: [2-[2-[(2-methyl-2-adamantyl)oxy]-2-oxoethoxy]-2-oxoethyl] 2-methylprop-2-enoate
• CAS: 1136072-07-5
• 化学式: C₁₉H₂₆O₆
• 分子量: 350.412
• InChiKey: UYYAVIMMSMPGAJ-UHFFFAOYSA-N

物化性质

• 沸点：
  444.5±25.0 °C(Predicted)
• 密度：
  1.20±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  25
• 可旋转键数：
  9
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.74
• 拓扑面积：
  78.9
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  2-(2-(2-methyl-2-adamantyloxy)-2-oxoethoxy)-2-oxo ethanol 、 甲基丙烯酰氯 在 4-甲氧基苯酚 、 三乙胺 作用下， 以 四氢呋喃 为溶剂， 以97%的产率得到2-(2-(2-methyl-2-adamantyloxy)-2-oxoethoxy)-2-oxoethyl methacrylate
  参考文献：
  名称：

  COMPOUND HAVING ALICYCLIC STRUCTURE, (METH)ACRYLIC ACID ESTER, AND PROCESS FOR PRODUCTION OF THE (METH)ACRYLIC ACID ESTER

  摘要：

  提供了一种含有脂环结构的化合物，一种（甲基）丙烯酸酯，以及一种生产酯的方法。该化合物和酯可用作半导体制造中用于光刻胶的单体等，并通过使用含有酯键的连接基团和/或含有醚键的连接基团的脂环结构化合物衍生的（甲基）丙烯酸酯，以及生产酯的方法，实现了在溶解性、相容性、缺陷减少、粗糙度改善等方面表现出色。

  公开号：

  US20110009661A1

文献信息

• Resist composition, method of forming resist pattern, novel compound, and acid generator
  申请人：Kawaue Akiya

  公开号：US20100136478A1

  公开（公告）日：2010-06-03

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).

  一种抗蚀组合物，包括在酸发生剂的作用下在碱性显影溶液中表现出改变溶解度的基础组分（A）和在暴露后产生酸的酸发生剂组分（B），酸发生剂组分（B）包括含有由通式（I）表示的阳离子基团的化合物的酸发生剂（B1）（在该式中，R5代表具有羰基、酯键或磺酰基的有机基团；Q代表二价连接基团）。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COMPOUND AND ACID GENERATOR
  申请人：UTSUMI Yoshiyuki

  公开号：US20100015555A1

  公开（公告）日：2010-01-21

  A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator consisting of a compound represented by general formula (b1). In formula (b1), Y 1 represents a fluorinated alkylene group of 1 to 4 carbon atoms, X represents an aliphatic cyclic group of 3 to 30 carbon atoms, R 11 ′ to R 13 ′ each represents an aryl group or alkyl group, provided that at least one of R 11 ′ to R 13 ′ is an aryl group having a substituent represented by general formula (b1-0), and two alkyl groups among R 11 ′ to R 13 ′ may be bonded to each other to form a ring with the sulfur atom in the formula. In formula (b1-0), R 52 represents a chain-like or cyclic hydrocarbon group, and f and g each represents 0 or 1

  一种抗蚀组合物，包括一种基础组分，在酸的作用下在碱性显影液中表现出改变的溶解度，以及一个酸发生剂，该酸发生剂由通式（b1）表示的化合物组成。在式（b1）中，Y1表示1至4个碳原子的氟化烷基，X表示3至30个碳原子的脂肪环状基团，R11′至R13′各自表示芳基或烷基，但至少其中一个R11′至R13′是带有通式（b1-0）所表示的取代基的芳基，且在R11′至R13′中的两个烷基可以与公式中的硫原子结合形成环。在式（b1-0）中，R52表示链状或环状的碳氢基团，f和g各自表示0或1。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME
  申请人：KAWAUE Akiya

  公开号：US20100081088A1

  公开（公告）日：2010-04-01

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.

  一种抗蚀组合物，包括一种基础成分(A)，在碱性显影液中在酸的作用下表现出改变的溶解度，以及一种酸发生器成分(B)，在曝光后生成酸，其中酸发生器成分(B)包括一种酸发生器(B1)，该酸发生器由具有阳离子部分中的碱性可解离基团的化合物组成。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR
  申请人：Kawaue Akiya

  公开号：US20120009521A1

  公开（公告）日：2012-01-12

  A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R 7″ to R 9″ each independently represent an aryl group or an alkyl group, wherein two of R 7″ to R 9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R 7″ to R 9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X − represents an anion; and R f represents a fluorinated alkyl group.

  一种抗蚀组合物，包括：一种基础组分（A），在酸的作用下在碱性显影液中表现出改变的溶解度；以及一种酸发生剂组分（B），在暴露后生成酸，其中所述酸发生剂组分（B）包括一种酸发生剂（B1），该酸发生剂（B1）包括下式（b1-11）所示的化合物：其中R7''至R9''各自独立地表示芳基或烷基，其中R7''至R9''中的两个可以结合形成带有硫原子的环，并且至少一个R7''至R9''表示带有下式（I）所表示的基团作为取代基的取代芳基；X-表示阴离子；Rf表示氟化烷基。
• ACRYLATE DERIVATIVES, ALCOHOL DERIVATIVES, AND METHOD FOR PRODUCING THEM
  申请人：SHIMIZU Kazuya

  公开号：US20120071667A1

  公开（公告）日：2012-03-22

  Provided are an acrylate derivative useful as a raw material of a polymer compound for resist compositions capable of giving resist patterns which are excellent in lithographic performance and have a good shape, an intermediate thereof (alcohol derivative) and production processes for them. To be specific, it is an acrylate derivative represented by a formula shown below: (wherein R 1 represents a hydrogen atom, methyl or trifluoromethyl; R 2 , R 3 , R 5 , R 7 , R 8 , R 9 and R 10 each represent independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms; R 4 and R 6 each represent independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms, or both of R 4 and R 6 are combined to represent an alkylene group having 1 to 3 carbon atoms, —O— or —S—; and R 11 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a cyclic hydrocarbon group having 3 to 10 carbon atoms).

  提供一种丙烯酸酯衍生物，作为聚合物化合物的原材料，用于制备抗蚀组分，能够产生卓越的光刻性能和良好形状的抗蚀图案，其中包括其中间体（醇衍生物）和其生产工艺。具体来说，它是一种由下式表示的丙烯酸酯衍生物：（其中R1代表氢原子、甲基或三氟甲基；R2、R3、R5、R7、R8、R9和R10各自独立地代表氢原子、具有1至6个碳原子的烷基、具有3至6个碳原子的环烷基或具有1至6个碳原子的烷氧基；R4和R6各自独立地代表氢原子、具有1至6个碳原子的烷基、具有3至6个碳原子的环烷基或具有1至6个碳原子的烷氧基，或R4和R6中的两个都组合起来表示具有1至3个碳原子的烷基、-O-或-S-；R11代表氢原子、具有1至6个碳原子的烷基或具有3至10个碳原子的环烃基）。