ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20210149301A1
公开(公告)日:2021-05-20
An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.
提供具有公式(1)的醇铵盐,作为酸扩散抑制剂和化学增强型抗蚀剂组合物。当通过光刻加工时,该抗蚀剂组合物表现出溶解对比度,抑制酸扩散效果以及出色的光刻性能因素,例如CDU,LWR和灵敏度。