2-Methyl-4-sek.-butyl-anisol | 31268-71-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-Methyl-4-sek.-butyl-anisol
• 英文别名: 4-sec.-Butyl-2-methyl-anisol；4-sec-Butyl-2-methylanisol；4-Butan-2-yl-1-methoxy-2-methylbenzene
• CAS: 31268-71-0
• 化学式: C₁₂H₁₈O
• 分子量: 178.274
• InChiKey: XRFJFUJASCADBB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2-Methyl-4-sek.-butyl-anisol 在 氢碘酸 、 乙酸酐 作用下， 生成 4-sec-Butyl-2-methyl-phenol
  参考文献：
  名称：

  200.酸催化的烷基芳基醚的重排。第四部分。氯化铝对甲苯基醚的重排

  摘要：

  DOI：

  10.1039/jr9600000959
• 作为产物：
  描述：

  4-溴-2-甲基苯酚 在 palladium on activated charcoal 氢气 作用下， 生成 2-Methyl-4-sek.-butyl-anisol
  参考文献：
  名称：

  200.酸催化的烷基芳基醚的重排。第四部分。氯化铝对甲苯基醚的重排

  摘要：

  DOI：

  10.1039/jr9600000959

文献信息

• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。
• Trisubstituted amine compound
  申请人：Nakamura Yoshinori

  公开号：US20090029994A1

  公开（公告）日：2009-01-29

  The present invention relates to a compound of the general formula (1): wherein, Y is a methylene group, and the like; A is an optionally substituted heterocyclic group, and the like; B is an optionally substituted phenyl group, and the like; R 1 is an optionally substituted alkyl group, and the like; and R 2 is an optionally substituted amino group, and the like; or a pharmaceutically acceptable derivative thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP), thereby being useful for prophylaxis and/or treatment of arteriosclerotic diseases, hyperlipemia or dyslipidemia, and the like.

  本发明涉及一般式(1)的化合物，其中Y是亚甲基基团等；A是可选择取代的杂环基团等；B是可选择取代的苯基团等；R1是可选择取代的烷基团等；R2是可选择取代的氨基团等；或其药学上可接受的衍生物，该化合物具有胆固醇酯转移蛋白（CETP）的抑制活性，因此可用于动脉粥样硬化疾病、高脂血症或异常脂质血症的预防和/或治疗等。
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
  申请人：Takahashi Hidenori

  公开号：US20120156618A1

  公开（公告）日：2012-06-21

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)

  根据一种实施例，一种感光射线或辐射敏感的树脂组合物包括树脂（P），该树脂不仅包含至少一个重复单元（A），当暴露于感光射线或辐射时，分解从而产生酸，并由下列任一通式（I）至（III）表示，而且还包括一个重复单元（B），其中至少包含一个芳香环基团，前提是重复单元（B）不包括通式（I）至（III）中的任何一个。（通式（I）至（III）中使用的字符在描述中有所提及。）
• TRISUBSTITUTED AMINE COMPOUND
  申请人：NAKAMURA Yoshinori

  公开号：US20110092506A1

  公开（公告）日：2011-04-21

  The present invention relates to a compound of the general formula (1): wherein, Y is a methylene group, and the like; A is an optionally substituted heterocyclic group, and the like; B is an optionally substituted phenyl group, and the like; R 1 is an optionally substituted alkyl group, and the like; and R 2 is an optionally substituted amino group, and the like; or a pharmaceutically acceptable derivative thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP), thereby being useful for prophylaxis and/or treatment of arteriosclerotic diseases, hyperlipemia or dyslipidemia, and the like.

  本发明涉及一种通式（1）的化合物：其中，Y是亚甲基基团等；A是可选取的取代杂环基团等；B是可选取的取代苯基团等；R1是可选取的取代烷基团等；R2是可选取的取代氨基团等；或其药学上可接受的衍生物。该化合物具有对胆固醇酯转移蛋白（CETP）的抑制活性，因此可用于预防和/或治疗动脉硬化性疾病、高脂血症或血脂异常等。
• ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
  申请人：KAWABATA Takeshi

  公开号：US20120082939A1

  公开（公告）日：2012-04-05

  An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided. The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.

  提供了一种活性光线敏感或放射线敏感的树脂组合物，其在很大程度上同时满足高灵敏度、高分辨率、良好的图案配置和良好的线边粗糙度，同时在曝光期间具有足够好的排气性能，以及使用该组合物形成的活性光线敏感或放射线敏感薄膜和形成图案的方法。本发明的活性光线敏感或放射线敏感的树脂组合物包括含有重复单元（A）的树脂（P），该重复单元通过活性光线或放射线辐射分解生成酸，并且含有主要或次要羟基的重复单元（C）。