2,2,5-trimethyl-3-(1'-(4''-hydroxymethyl)phenylethoxy)-4-phenyl-3-azahexane | 433266-98-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,2,5-trimethyl-3-(1'-(4''-hydroxymethyl)phenylethoxy)-4-phenyl-3-azahexane
• 英文别名: 2,2,5-trimethyl-3-(1'-p-hydroxymethylphenylethoxy)-4-phenyl-3-azahexane；2,2,5-trimethyl-3-(p-hydroxymethylphenylethoxy)-4-phenyl-3-azahexane；[4-[1-[Tert-butyl-(2-methyl-1-phenylpropyl)amino]oxyethyl]phenyl]methanol
• CAS: 433266-98-9
• 化学式: C₂₃H₃₃NO₂
• 分子量: 355.521
• InChiKey: VPLQLKINAUMSCQ-UHFFFAOYSA-N

物化性质

• 沸点：
  469.2±55.0 °C(Predicted)
• 密度：
  1.032±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  26
• 可旋转键数：
  8
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.48
• 拓扑面积：
  32.7
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  1H,1H-全氟-1-壬醇 、 2,2,5-trimethyl-3-(1'-(4''-hydroxymethyl)phenylethoxy)-4-phenyl-3-azahexane 在 三丁基膦 、 1,1'-azodicarbonyl-dipiperidine 作用下， 以 苯 为溶剂， 反应 3.5h， 以80%的产率得到N-(tert-butyl)-O-(1-(4-(((2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-heptadecafluorononyl)oxy)methyl)phenyl)ethyl)-N-(2-methyl-1-phenylpropyl)hydroxylamine
  参考文献：
  名称：

  用于高保真嵌段共聚物纳米压印光刻的界面隔离氟烷基改性聚合物

  摘要：

  嵌段共聚物 (BCP) 光刻是一种强大的技术，可以将纳米级特征的周期性阵列以极高的密度写入基板。为了将这些特征随意放置在基板上，纳米压印为实现高产量生产提供了一条看似清晰的路径：纳米压印模具可重复使用，促进 BCP 微域在其形貌内的石墨外延对准，并使用干涉测量法相对于基板有效对准。不幸的是，当 BCP 薄膜受到热纳米压印时，模具-聚合物界面处的粘附程度很大，这会影响整个过程。在这里，我们报告了基于具有短的界面活性氟烷基链的 PS 或 PDMS 来减轻粘附的添加剂的合成。当与 PS-b-PDMS BCP 混合并进行热纳米压印时，观察到特别是氟代烷基改性的 PS 会显着降低薄膜对模具的附着力，从而产生几乎无缺陷的纳米压印。随后的光刻程序揭示了亚 10 nm BCP 微域的出色石墨外延排列，这是迈向低成本、高通量纳米制造的关键一步。

  DOI：

  10.1021/ja1094292
• 作为产物：
  描述：

  N-叔丁基-O-[1-[4-(氯甲基)苯基]乙基]-N-(2-甲基-1-苯丙基)羟胺 在 sodium hydroxide 、 18-冠醚-6 作用下， 以 六甲基磷酰三胺 、 乙醇 为溶剂， 反应 66.0h， 生成 2,2,5-trimethyl-3-(1'-(4''-hydroxymethyl)phenylethoxy)-4-phenyl-3-azahexane
  参考文献：
  名称：

  功能化三维大分子的模块化方法：从合成概念到实际应用

  摘要：

  已经探索了一种通过氮氧介导的“活性”自由基聚合制备功能性多臂星形聚合物的新策略。这种合成三维大分子结构的方法的通用性允许从结合非极性和极性乙烯基重复单元的各种不同的均聚物、嵌段和无规共聚物构建纳米级定义的材料。官能团也可以包含在主链上或作为外围/链端基团，从而调节星形定义部分的反应性和极性。这种合成三维大分子的模块化方法允许将这些定制材料作为多功能主体用于氢键、纳米颗粒形成和催化基团的支架。

  DOI：

  10.1021/ja028392s

文献信息

• A Versatile Method for Tuning the Chemistry and Size of Nanoscopic Features by Living Free Radical Polymerization
  作者：Timothy A. von Werne、David S. Germack、Erik C. Hagberg、Valerie V. Sheares、Craig J. Hawker、Kenneth R. Carter

  DOI：10.1021/ja028866n

  日期：2003.4.1

  which represent a grafted layer of linear chains attached to the original network polymer. Grafts consisting of polystyrene, poly(methyl methacrylate), and poly(2-hydroxyethyl)methacrylate were grown with controlled thicknesses ranging from 10 to 143 nm and graft molecular weights of between 18 000 to 290 000 amu. As a result of this secondary graft process, feature sizes could be tuned from the original

  提出了一种使用接触成型和活性自由基聚合的组合来操纵纳米级特征的尺寸和化学的新方法。在这种方法中，基于甲基丙烯酸酯/丙烯酸酯混合物的高度交联的光聚合物使用接触成型技术在硅晶片上图案化成亚微米尺寸的特征。单体混合物的一个关键成分是将含有单体的引发剂掺入网络结构中，这为官能团放大提供了位置。尺寸范围从 5 微米到 <60 纳米的特征通过此过程和活性自由基聚合（原子转移自由基和氮氧介导聚合 (NMP)）准确复制，可以从这些起始位点进行以产生聚合物刷，其代表连接到原始网络聚合物的线性链的接枝层。由聚苯乙烯、聚（甲基丙烯酸甲酯）和聚（2-羟乙基）甲基丙烯酸酯组成的接枝以 10 至 143 nm 的受控厚度和 18 000 至 290 000 amu 的接枝分子量生长。由于这种二次接枝过程，特征尺寸可以从最初的 100 nm 调整到 20 nm，并且表面化学从相同的初始主图案开始从亲水性变为疏水性。薄膜
• Neutral layer polymers, methods of manufacture thereof and articles comprising the same
  申请人：Dow Global Technologies LLC

  公开号：US10167411B2

  公开（公告）日：2019-01-01

  Disclosed herein is a block copolymer comprising a first segment and a second segment that are covalently bonded to each other and that are chemically different from each other; where the first segment has a first surface free energy and where the second segment has a second surface free energy; and an additive copolymer; where the additive copolymer comprises a surface free energy reducing moiety where the surface free energy reducing moiety has a lower surface free energy than that of the first segment and the second segment; the additive copolymer further comprising one or more moieties having an affinity to the block copolymer; where the surface free energy reducing moiety is chemically different from the first segment and from the second segment; where the additive copolymer is not water miscible; and where the additive copolymer is not covalently bonded with the block copolymer.

  本文公开了一种嵌段共聚物，包括相互共价键合且化学性质不同的第一段和第二段；其中第一段具有第一表面自由能，第二段具有第二表面自由能；以及添加剂共聚物；其中添加剂共聚物包括降低表面自由能的分子，降低表面自由能的分子的表面自由能低于第一段和第二段的表面自由能；添加剂共聚物进一步包括一个或多个与嵌段共聚物具有亲和性的分子； 其中降低表面自由能的分子与第一段和第二段的化学性质不同； 其中添加剂共聚物不与水混溶；以及 其中添加剂共聚物不与嵌段共聚物共价键合。
• Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US10294359B2

  公开（公告）日：2019-05-21

  Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer comprising a polymer wherein the surface tension of the polymer with the first polymer and the surface tension of the polymer with the second polymer are both lower than the surface tension between the first polymer and second polymer; where the additive polymer comprises a reactive functional moiety that forms a bond or a complex or a coordinate with the substrate upon being disposed on the substrate; where the reactive functional moiety is unreacted when it is a part of the composition; and a solvent.

  本文公开了一种由嵌段共聚物组成的组合物，其中嵌段共聚物包括第一种聚合物和第二种聚合物；嵌段共聚物的第一种聚合物和第二种聚合物彼此不同，嵌段共聚物形成相分离结构；由聚合物组成的添加剂聚合物，其中聚合物与第一种聚合物的表面张力和聚合物与第二种聚合物的表面张力均低于第一种聚合物和第二种聚合物之间的表面张力；添加剂聚合物包括反应性官能团，该反应性官能团被置于基底上时与基底形成键合、络合或配位；反应性官能团作为组合物的一部分时未发生反应；以及溶剂。
• NEUTRAL LAYER POLYMERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME
  申请人：Dow Global Technologies LLC

  公开号：US20140378592A1

  公开（公告）日：2014-12-25

  Disclosed herein is a block copolymer comprising a first segment and a second segment that are covalently bonded to each other and that are chemically different from each other; where the first segment has a first surface free energy and where the second segment has a second surface free energy; and an additive copolymer; where the additive copolymer comprises a surface free energy reducing moiety where the surface free energy reducing moiety has a lower surface free energy than that of the first segment and the second segment; the additive copolymer further comprising one or more moieties having an affinity to the block copolymer; where the surface free energy reducing moiety is chemically different from the first segment and from the second segment; where the additive copolymer is not water miscible; and where the additive copolymer is not covalently bonded with the block copolymer.
• COPOLYMER FORMULATIONS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME
  申请人：Dow Global Technologies LLC

  公开号：US20150184017A1

  公开（公告）日：2015-07-02

  Disclosed herein is a method comprising disposing a mat composition on a surface of a semiconductor substrate; where the mat composition comprises a random copolymer comprising a first acrylate unit and a second unit; where the copolymer does not comprise a polystyrene or a polyepoxide; crosslinking the random copolymer; disposing a brush backfill composition on the substrate; such that the brush backfill composition and the mat composition alternate with each other; disposing on the brush backfill composition and on the mat composition a block copolymer that undergoes self assembly; and etching the block copolymer to create uniformly spaced channels in the semiconductor substrate.