申请人:Ciba-Geigy Corporation
公开号:US05693807A1
公开(公告)日:1997-12-02
The invention relates to substituted hydroquinone derivatives of the general formula I ##STR1## wherein R.sub.4 is lower alkyl and either R.sub.1 is hydroxy, halogen, a group of the formula --P(=O)(R.sub.5)R.sub.6 (Ia), a group of the formula --P.sup.+ (R.sub.7)(R.sub.8)R.sub.9 X.sup.- (Ib) or a group of the formula --Si(R.sub.7)(R.sub.8)R.sub.9 (Ic), M is methylene, R.sub.2 is hydrogen or a group of the formula ##STR2## and R.sub.3 is hydrogen or halogen, or .sub.1 is hydroxy or lower alkoxy, M is carbonyl, R.sub.2 is hydrogen and R.sub.3 is halogen, each of R.sub.5 and R.sub.6, independently of the other, is lower alkyl, lower alkoxy Or N,N-di-lower alkylamino, or is benzyl, benzyloxy, phenyl or phenoxy, each of which is unsubstituted or mono- or di-substituted at the phenyl ring, to a process for the preparation of those compounds and to the use of those compounds, and to a process in which those compounds are used.
本发明涉及一般式I的取代羟基苯醌衍生物,其中R.sub.4是低碳基,且R.sub.1是羟基、卤素、式--P(=O)(R.sub.5)R.sub.6(Ia)、式--P.sup.+(R.sub.7)(R.sub.8)R.sub.9 X.sup.-(Ib)或式--Si(R.sub.7)(R.sub.8)R.sub.9(Ic)的基团之一,M为亚甲基,R.sub.2为氢或式##STR2##,R.sub.3为氢或卤素,或.sub.1为羟基或低碳基氧基,M为羰基,R.sub.2为氢,R.sub.3为卤素,R.sub.5和R.sub.6分别独立地是低碳基、低碳基氧基或N,N-二低碳基氨基,或是苄基、苄氧基、苯基或苯氧基,其中每个在苯环上未取代或单取代或二取代的。本发明还涉及制备这些化合物的过程以及使用这些化合物的用途和使用这些化合物的过程。