2,6-bis(4-azidobenzylidene)cyclohexanone | 20237-98-3

• 物质功能分类: 化学试剂 - 有机试剂 - 叠氮
• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,6-bis(4-azidobenzylidene)cyclohexanone
• 英文别名: (2E,6Z)-2,6-bis[(4-azidophenyl)methylidene]cyclohexan-1-one
• CAS: 20237-98-3
• 化学式: C₂₀H₁₆N₆O
• 分子量: 356.387
• InChiKey: UZNOMHUYXSAUPB-RFTYBOQRSA-N

物化性质

• 熔点：
  140 °C

计算性质

• 辛醇/水分配系数(LogP)：
  6.9
• 重原子数：
  27
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.15
• 拓扑面积：
  45.8
• 氢给体数：
  0
• 氢受体数：
  5

安全信息

• 危险等级：
  4.1

反应信息

• 作为产物：
  描述：

  syn-4-硝基苯甲醛肟 在 盐酸 、 苯酐 、 sodium azide 、 sodium 、 sodium nitrite 作用下， 以 甲醇 、 乙醇 、 水 为溶剂， 反应 5.0h， 生成 2,6-bis(4-azidobenzylidene)cyclohexanone
  参考文献：
  名称：

  Sauer, Erika; Schopf, Gudrun; Czarnetzki, Kerstin, Zeitschrift fur Chemie, 1987, vol. 27, # 9, p. 335 - 336

  摘要：

  DOI：

文献信息

• NITROXIDE CONTAINING ELECTRODE MATERIALS FOR SECONDARY BATTERIES
  申请人：Nesvadba Peter

  公开号：US20100181527A1

  公开（公告）日：2010-07-22

  This invention relates to a stable secondary battery utilizing as active principle the oxidation and reduction cycle of a sterically hindered nitroxide radical, a sterically hindered oxoammonium cation, a sterically hindered hydroxylamine or a sterically hindered aminoxide anion containing a piperazin-2,6-dione, a piperazin-2-one or morpholin-2-one structural unit. Further aspects of the invention are a method for providing such a secondary battery, the use of the respective compounds as active elements in secondary batteries and selected novel compounds.

  本发明涉及一种稳定的二次电池，利用空间位阻的亚硝基自由基、空间位阻的氧代铵阳离子、空间位阻的羟胺或空间位阻的氨氧阴离子，其中包含哌嗪-2,6-二酮、哌嗪-2-酮或吗啉-2-酮结构单元的氧化还原循环作为活性原理。发明的其他方面包括提供这种二次电池的方法，使用相应化合物作为二次电池中的活性元素以及选择的新化合物。
• DIVERSITY-ORIENTED POLYMERS OF INTRINSIC MICROPOROSITY AND USES THEREOF
  申请人：The Regents of the University of California

  公开号：US20210309802A1

  公开（公告）日：2021-10-07

  The present disclosure is directed to raicroporous ladder polymers containing amine-functionalized monomer segments, amidoxime-functionalized monomer segments, or a combination thereof. Monomer compounds for preparation of the polymers are also described, as well as membranes and electrochemical cells containing the polymers.

  本公开涉及含有胺基化单体段、酰胺肟化单体段或两者组合的多孔梯形聚合物。还描述了用于制备聚合物的单体化合物，以及包含聚合物的膜和电化学电池。
• Methods for Producing Water-Absorbent Foamed Polymer Particles
  申请人：Lopez Villanueva Francisco Javier

  公开号：US20120232177A1

  公开（公告）日：2012-09-13

  A process for preparing water-absorbing polymer particles, comprising polymerization of a foamed monomer solution or suspension, drying, grinding and classification.

  一种制备吸水性高分子颗粒的方法，包括聚合泡沫单体溶液或悬浮液，干燥，研磨和分类。
• Selective etching method of polyimide type resin film
  申请人：Hitachi, Ltd.

  公开号：EP0082417A2

  公开（公告）日：1983-06-29

  Disclosed is a selective etching method of a polyimide type resin film which uses an etching mask consisting of a negative type photoresist material prepared by adding a photosensitive reagent to an unsaturated ketone polymer such as polymethylisopropenylketone as the base resin and an etching solution consisting of 20 to 40 % by volume of hydrazine hydrate and the balance of a polyamine. The etching method of the present invention can provide the pattern of the polyimide type resin film having high dimensional accuracy by wet etching.

  本发明公开了一种聚酰亚胺型树脂薄膜的选择性蚀刻方法，该方法使用的蚀刻掩模由阴性型光致抗蚀剂材料和蚀刻溶液组成，阴性型光致抗蚀剂材料是通过在不饱和酮聚合物（如聚甲基异丙烯基酮）中加入光敏试剂制备的，而不饱和酮聚合物是基础树脂，蚀刻溶液由 20% 至 40% （按体积计）的水合肼和余量的多胺组成。 本发明的蚀刻方法可以通过湿法蚀刻提供具有高尺寸精度的聚酰亚胺型树脂薄膜图案。
• Photosensitive Polymer
  申请人：Chisso Corporation

  公开号：EP0337698A2

  公开（公告）日：1989-10-18

  A photosensitive polymer has an inherent viscosity of 0.1 to 5 dl/g and contains repeating units of the formula: in which R¹ is a trivalent or tetravalent carbocyclic aromatic group or hetrocyclic group; R² is an aliphatic group having at least 2 carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbocyclic aromatic group, a heterocyclic or a polysiloxane group; R³ is a monovalent organic group having a photosensitive unsaturated group; R⁴ is a monovalent organic group; m is 1 or 2; n is 0 or 1; and the sum of m and n is 1 or 2. The polymer may be prepared by reacting a poly­(amide)isoimide with a secondary amine containing a photosensitive unsaturated group. A photosensitive polymer composition comprises the polymer, a photo­polymerization initiator, a sensitizer, a diazide compound, a compound having a carbon-carbon double bond and a solvent. A method for forming a patterned poly(amide)imide film comprises applying the composition to a substrate, prebaking it, irradiating it through a patterned mask, developing, drying and postbaking it at a temperature of 200 to 500°C.

  一种光敏聚合物的固有粘度为 0.1 至 5 dl/g，含有式中的重复单元： 其中 R¹ 是三价或四价碳环芳香基团或七环基团；R² 是至少有 2 个碳原子的脂族基团、脂环基团、芳香脂族基团、碳环芳香基团、杂环基团或聚硅氧烷基团；R³ 是具有光敏不饱和基团的一价有机基团；R⁴ 是一价有机基团；m 是 1 或 2；n 是 0 或 1；m 与 n 之和是 1 或 2。 聚合物可通过聚（酰胺）异亚胺与含有光敏不饱和基团的仲胺反应制备。光敏聚合物组合物由聚合物、光聚合引发剂、敏化剂、重氮化物、具有碳碳双键的化合物和溶剂组成。形成图案化聚（酰胺）酰亚胺薄膜的方法包括将组合物涂在基底上，预烘烤，通过图案化掩膜照射，显影，干燥，在 200 至 500°C 的温度下进行后烘烤。