MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARDMASK COMPOSITION
申请人:CHEIL INDUSTRIES INC.
公开号:US20150301446A1
公开(公告)日:2015-10-22
Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same.
In the above Chemical Formula 1, A, A′, L, L′, X and n are the same as defined in the specification.