ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
申请人:INASAKI Takeshi
公开号:US20130004888A1
公开(公告)日:2013-01-03
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition.
The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification).
ALAM M., PAKISTAN J. SCI. RES., 19, 31, NO 1-2, 17-21
作者:ALAM M.
DOI:——
日期:——
Oxime Compound and Resist Composition Containing the Same
申请人:MASUYAMA Tatsuro
公开号:US20100021847A1
公开(公告)日:2010-01-28
An oxime compound represented by the formula (I):
wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R
1
) represents a C1-C30 aliphatic hydrocarbon group etc., R
2
represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q
1
and Q
2
each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.