According to the present invention a highly photosensitive imaging element is provided, comprising on a support a photosensitive coating comprising a homopolymer or copolymer of a monomer having a styryl type nitrogen-containing heterocyclic ring and wherein the corresponding monomer units have been quaternized from 0 to 100%, characterized in that said photosensitive imaging element was given an overall exposure using an energy dose smaller than the energy dose required for inducing gelation of the photosensitive resin and/or was given a thermal treatment. The present invention further provides a method for making said imaging element. Finally the present invention provides a high photosensitive resin composition based on a homopolymer or copolymer of a monomer of the styryl type nitrogen-containing heterocyclic ring.
根据本发明,提供了一种高光敏成像元件,该元件在支架上包含一层光敏涂层,该涂层由具有
苯乙烯基型含氮杂环的单体的均聚物或共聚物组成,其中相应的单体单元已被季
铵化0至100%,其特征在于,所述光敏成像元件经过整体曝光,使用的能量剂量小于诱导光敏
树脂凝胶化所需的能量剂量,并且/或者经过热处理。本发明进一步提供了制造所述成像元件的方法。最后,本发明提供了一种基于
苯乙烯类含氮杂环单体的均聚物或共聚物的高光敏
树脂组合物。