A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R
1
is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.
一种正性光刻胶组合物包括(A)在酸的作用下在碱性显影剂中变得可溶的
树脂组分和(B)酸发生剂。
树脂(A)是一种聚合物,包含由式(1)表示的非离去羟基的重复单元,其中R1为H、甲基或三
氟甲基,X为单键或亚甲基,m为1或2,并且羟基连接到次级碳原子。当通过光刻工艺处理时,该组合物在分辨率方面得到改善。