申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20040152009A1
公开(公告)日:2004-08-05
The present invention provides a sulfonate of the formula (I):
1
wherein Q
1
, Q
2
, Q
3
, Q
4
and Q
5
each independently represent hydrogen, alkyl having 1 to 16 carbon atoms, alkoxy having 1 to 16 carbon atoms, halogen, aryl having 6 to 12 carbon atoms, aralkyl having 7 to 12 carbon atoms, cyano, sulfide, hydroxy, nitro or a group of the formula (I′)
—COO—X—Cy
1
(I′)
wherein X represents alkylene and at least one —CH
2
— in the alkylene may be substituted by —O— or —S—, and Cy
1
represents alicyclic hydrocarbon having 3 to 20 carbon atoms,
and A
+
represents a counter ion, with the proviso that at least one of Q
1
, Q
2
, Q
3
, Q
4
and Q
5
is the group of the formula (I′).
The present invention also provides a chemical amplification type positive resist composition comprising a sulfonate of the formula (I) and resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid
本发明提供了公式(I)的磺酸盐:其中Q1、Q2、Q3、Q4和Q5分别独立地表示氢、1至16个碳原子的烷基、1至16个碳原子的烷氧基、卤素、6至12个碳原子的芳基、7至12个碳原子的芳基烷基、氰基、硫化物、羟基、硝基或公式(I') - COO - X - Cy1(I')的基团,其中X表示烷基,烷基中至少有一个-CH2-可能被-O-或-S-取代,Cy1表示3至20个碳原子的脂环烃,并且A+表示一个反离子,但至少有一个Q1、Q2、Q3、Q4和Q5是公式(I')的基团。本发明还提供了一种化学放大型正性光刻胶组合物,包括公式(I)的磺酸盐和树脂,该树脂含有具有酸敏感基团的结构单元,本身在碱性水溶液中不溶或难溶,但在酸的作用下变得可溶于碱性水溶液。