The ensuing paper summarizes an investigation on the effect of target microstructural morphology on resultant sputter deposited media magnetic performance. Significant differences in media magnetic coercivity were obtained from Co–Cr–Pt–Ta targets possessing the same chemistry, sputtered under identical conditions, but possessing different microstructural phase and crystallographic texture characteristics. This result was most likely caused by the difference in sputter yields for the Ta-containing phases in the two distinct target microstructures. Results support enhanced chromium segregation yielding a decrease in the intergranuler exchange energy field for the deposited thin films.
接下来的论文总结了关于靶材微观结构形态对溅射沉积介质磁性能影响的研究。具有相同化学成分的 Co-Cr-Pt-Ta 靶材在相同条件下溅射,但具有不同的微观结构相和晶体纹理特征,因此介质磁矫顽力存在显著差异。造成这一结果的原因很可能是两种不同靶材微观结构中含 Ta 相的溅射产率不同。研究结果表明,铬偏析增强导致沉积薄膜的粒间交换能场降低。