[EN] ORGANOMETALLIC COMPOUNDS AND METHODS FOR THE DEPOSITION OF HIGH PURITY TIN OXIDE<br/>[FR] COMPOSÉS ORGANOMÉTALLIQUES ET PROCÉDÉS DE DÉPÔT D'OXYDE D'ÉTAIN DE HAUTE PURETÉ
申请人:SEASTAR CHEMICALS INC
公开号:WO2019023797A1
公开(公告)日:2019-02-07
Disclosed herein are compounds useful for the deposition of high purity tin oxide. Also disclose are methods for the deposition of tin oxide films using such compounds. Such films demonstrate high conformality, high etch selectivity and are optically transparent. Such compounds are those of the Formula as follows R x -Sn-A 4-x wherein: A is selected from the group consisting of (Y a R' z ) and a 3- to 7-membered N- containing heterocyclic group; each R group is independently selected from the group consisting of an alkyl or aryl group having from 1 to 10 carbon atoms; each R' group is independently selected from the group consisting of an alkyl, acyl or aryl group having from 1 to 10 carbon atoms; x is an integer from 0 to 4; a is an integer from 0 to 1; Y is selected from the group consisting of N, O, S, and P; and z is 1 when Y is O, S or when Y is absent and z is 2 when Y is N or P.
本文揭示了用于沉积高纯度氧化锡的化合物。还披露了使用这些化合物进行氧化锡薄膜沉积的方法。这些薄膜表现出高一致性、高刻蚀选择性并具有光学透明性。这些化合物的化学式如下:Rx-Sn-A4-x,其中:A选自(YaR'z)和含有3至7个成员的含氮杂环基团的群;每个R基独立地选自具有1至10个碳原子的烷基或芳基群;每个R'基独立地选自具有1至10个碳原子的烷基、酰基或芳基群;x为0至4的整数;a为0至1的整数;Y选自N、O、S和P的群;z为1(当Y为O、S或Y不存在时)或z为2(当Y为N或P时)。