QUATERNARY AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20150357204A1
公开(公告)日:2015-12-10
A quaternary ammonium salt compound is represented by the following formula (A-1),
wherein, R
1
, R
2
, and R
3
each represent an alkyl group, an alkenyl group, an aryl group, or an aralkyl group, a part or all of hydrogen atoms in these groups may be substituted by a hydroxyl group(s), an alkoxy group(s), or a halogen atom(s), and these groups may include one or more of a carbonyl group and an ester bond; R
4
represents a single bond, an alkylene group, an alkenylene group, an arylene group, or an aralkylene group, a part or all of hydrogen atoms in these groups may be substituted by an alkoxy group(s) or a halogen atom(s), and these groups may include one or more of an ether bond, a carbonyl group, an ester bond, and an amide bond; and A
−
represents a non-nucleophilic counter ion.
一个四元铵盐化合物由以下式(A-1)表示,其中,R1、R2和R3分别代表烷基、烯基、芳基或芳基烷基,这些基团中的氢原子的一部分或全部可以被羟基、烷氧基或卤原子取代,这些基团中可能包括一个或多个羰基和酯键;R4代表一个单键、烷基、烯基、芳基或芳基烷基,这些基团中的氢原子的一部分或全部可以被烷氧基或卤原子取代,这些基团中可能包括一个或多个醚键、羰基、酯键和酰胺键;A−代表一个非亲核对离子。