2,8,14,20-Tetrakis(4-cyclohexylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol | 1021604-68-1

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 2,8,14,20-Tetrakis(4-cyclohexylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
• CAS: 1021604-68-1
• 化学式: C₇₆H₈₀O₈
• 分子量: 1121.47
• InChiKey: CQQGRAWMMYCSML-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  20.8
• 重原子数：
  84
• 可旋转键数：
  8
• 环数：
  13.0
• sp3杂化的碳原子比例：
  0.37
• 拓扑面积：
  162
• 氢给体数：
  8
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  环己基苯 在 氢氟酸 、 三氟化硼 作用下， 以 乙醇 、 正庚烷 为溶剂， -30.0~85.0 ℃ 、2.0 MPa 条件下， 反应 4.5h， 生成 2,8,14,20-Tetrakis(4-cyclohexylphenyl)pentacyclo[19.3.1.13,7.19,13.115,19]octacosa-1(25),3(28),4,6,9(27),10,12,15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol
  参考文献：
  名称：

  COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD

  摘要：

  本发明提供了一种用于抗蚀底层膜形成的组合物，其包括含碲化合物或含碲树脂。

  公开号：

  US20200249573A1

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• BICYCLOHEXANE DERIVATIVE AND PRODUCTION METHOD FOR SAME
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2524907A1

  公开（公告）日：2012-11-21

  A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m' represents an integer of 0 to 10.)

  提供了一种在光刻胶领域、药物和杀虫剂的中间体领域等领域中有用的一种萜环己烷衍生物化合物，以及其制备方法。提供了由下述通用公式（II）表示的一种萜环己烷衍生物化合物。（在公式（II）中，Y独立表示1至10个碳原子的烷基、卤素原子、酰氧基、烷氧羰基或羟基，X1表示卤素原子，m表示0至11的整数，m'表示0至10的整数。）
• BICYCLOHEXANE DERIVATIVE COMPOUND AND MANUFACTURING METHOD OF THE SAME
  申请人：Echigo Masatoshi

  公开号：US20130030211A1

  公开（公告）日：2013-01-31

  A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X 1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.)

  提供了一种在光刻领域、药物和农药中间体领域等方面有用的双环己烷衍生物化合物，以及其制造方法。提供了一种由以下通式（II）表示的双环己烷衍生物化合物。（在式（II）中，Y独立表示1至10个碳原子的烷基，卤素原子，酰氧基，烷氧羰基或羟基，X1表示卤素原子，m表示0至11的整数，n表示0至10的整数。）
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
  申请人：FUJIFILM CORPORATION

  公开号：US20150010855A1

  公开（公告）日：2015-01-08

  There is provided an actinic ray-sensitive or radiation-sensitive composition containing (α) a compound represented by the formula (αI) capable of generating an acid having a size of 200 Å 3 or more in volume and (β) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (αI) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.

  提供一种感光或辐射敏感的组合物，其中包含(α)一种化合物，其由公式(αI)表示，能够产生大小为200Å3或更大的体积的酸，以及(β)一种化合物，能够在受到光辐射或辐射时产生酸，公式(αI)的定义如本文所述。还提供了使用该感光或辐射敏感组合物形成的光阻膜，涂有光阻膜的光阻涂层掩模坯料，包括曝光光阻膜和显影曝光后膜的光阻图案形成方法，通过曝光和显影涂有光阻涂层的掩模坯料获得的光掩模，以及一种电子器件的制造方法，包括光阻图案形成方法和制造电子器件的电子器件制造方法，以及通过该电子器件制造方法制造的电子器件。
• COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
  申请人：Echigo Masatoshi

  公开号：US20130122423A1

  公开（公告）日：2013-05-16

  The object is to provide a compound having high dissolvability in a safe solvent and high sensitivity, and also capable of obtaining a good resist pattern shape, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition. For this purpose, a compound (B) obtained by reaction between a polyphenol based cyclic compound (A) and a compound (C) having a particular structure, a radiation-sensitive composition containing the same, and a resist pattern formation method using the composition are provided.

  本发明的目的是提供一种在安全溶剂中具有高溶解度和高灵敏度的化合物，同时还能获得良好的抗蚀图案形状，包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。为此，提供了通过多酚基环状化合物（A）和具有特定结构的化合物（C）反应得到的化合物（B），包含该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。