The rates of thermal conversion of seven simple dewarbenzene derivatives to their corresponding benzene isomers were measured. Relatively minor substituent changes were found to have profound effects; isomerization rates increased with the number and strength of electron-withdrawing moieties. Surprisingly, the rate of thermalisomerization for one derivative was the same in fluid solution as in a solid
Dewar Benzene as a Protecting Group? Demonstration of Photolithographic Crystallization
作者:Michael J. Marsella、Mathew M. Meyer、Fook S. Tham
DOI:10.1021/ol0166810
日期:2001.11.1
The concept of Dewarbenzene as a supramolecular protecting group for solid-state aryl-aryl interactions is reported. Photoisomerization of 1,4,5,6-tetramethyl-bicyclo[2.2.0]hexa-2,5-diene-2,3-dicarboxylic acid dimethyl ester (1) to the corresponding benzene isomer proceeds with rapid crystal formation. Herein this property is applied to the photolithographic patterning of crystal domains on a surface