bisphenoxyethane | 4850-74-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: bisphenoxyethane
• 英文别名: (oxybis(ethane-1,1-diyl))dibenzene；1,1-diphenoxyethane；diphenoxyethane；acetaldehyde diphenylacetal；Acetaldehyd-diphenylacetal；1.1-Diphenoxy-aethan；1-phenoxyethoxybenzene
• CAS: 4850-74-2
• 化学式: C₁₄H₁₄O₂
• 分子量: 214.264
• InChiKey: FRRIJIONUFQFSM-UHFFFAOYSA-N

物化性质

• 熔点：
  9-10 °C
• 沸点：
  154-155 °C(Press: 14 Torr)
• 密度：
  1.087 g/cm3

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  16
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  溴丁基-镁 、 bisphenoxyethane 在 乙醚 作用下， 生成 (hexan-2-yloxy)benzene
  参考文献：
  名称：

  Schostakowskii; Kulibekow, Zhurnal Obshchei Khimii, 1958, vol. 28, p. 951,952; engl. Ausg. S. 926, 927

  摘要：

  DOI：
• 作为产物：
  描述：

  苯基乙烯醚 在 溶剂黄146 作用下， 生成 bisphenoxyethane
  参考文献：
  名称：

  Gerschtein; Schosstakowsski, Zhurnal Obshchei Khimii, 1948, vol. 18, p. 1989,1991, 1995

  摘要：

  DOI：

文献信息

• Flash vacuum pyrolysis over magnesium. Part 1. Pyrolysis of benzylic, other aryl/alkyl and aliphatic halides
  作者：R. Alan Aitken、Philip K. G. Hodgson、John J. Morrison、Adebayo O. Oyewale

  DOI：10.1039/b108663d

  日期：2002.1.23

  Flash vacuum pyrolysis over a bed of freshly sublimed magnesium on glass wool results in efficient coupling of benzyl halides to give the corresponding bibenzyls. Where an ortho halogen substituent is present further dehalogenation gives some dihydroanthracene and anthracene. Efficient coupling is also observed for halomethylnaphthalenes and halodiphenylmethanes while chlorotriphenylmethane gives 4,4′-bis(diphenylmethyl)biphenyl. By using α,α′-dihalo-o-xylenes, benzocyclobutenes are obtained in good yield, while the isomeric α,α′-dihalo-p-xylenes give a range of high thermal stability polymers by polymerisation of the initially formed p-xylylenes. Other haloalkylbenzenes undergo largely dehydrohalogenation where this is possible, in some cases resulting in cyclisation. Deoxygenation is also observed with haloalkyl phenyl ketones to give phenylalkynes as well as other products. With simple alkyl halides there is efficient elimination of HCl or HBr to give alkenes. For aliphatic dihalides this also occurs to give dienes but there is also cyclisation to give cycloalkanes and dehalogenation with hydrogen atom transfer to give alkenes in some cases. For 5-bromopent-1-ene the products are those expected from a radical pathway but for 6-bromohex-1-ene they are clearly not. For 2,2-dichloropropane and 1,1-dichloropropane elimination of HCl occurs but for 1,1-dichlorobutane, -pentane and -hexane partial hydrolysis followed by elimination of HCl gives E,E-, E,Z- and Z,Z- isomers of the dialk-1-enyl ethers and fully assigned 13C NMR data are presented for these. With 6-chlorohex-1-yne and 7-chlorohept-1-yne there is cyclisation to give methylenecycloalkanes and -cycloalkynes. The behaviour of 1,2-dibromocyclohexane and 1,2-dichlorocyclooctane under these conditions is also examined. Various pieces of evidence are presented that suggest that these processes do not involve generation of free gas-phase radicals but rather surface-adsorbed organometallic species.

  在玻璃棉上覆盖一层新升华的镁,进行闪式真空热解,能有效促使苄基卤化物耦合生成相应的联苄。当有邻位卤素取代基存在时,进一步脱卤生成部分二氢蒽和蒽。卤甲基萘和二苯基甲烷也能高效耦合,而三苯基氯甲烷则生成4,4′-双(二苯甲基)联苯。用α,α′-二卤代邻二甲苯可以获得较高产率的苯并环丁烯,而异构的α,α′-二卤代对二甲苯,通过形成的对二甲苯的聚合,可以得到一系列高热稳定性的聚合物。其他卤代烃苯大体上会脱卤化氢,某些情况下能产生环化反应。同样可以观察到,苯基卤代烷烃脱去羰基生成苯乙炔以及其他产物。简单的烷基卤化物则高效地脱去HCl或HBr生成烯烃。脂肪族二卤化物也会发生这一反应生成二烯,但不发生环化反应生成环烷烃,或在某些情况下发生氢原子转移的脱卤反应生成烯烃。5-溴戊-1-烯的产物符合自由基途径的预期,但6-溴己-1-烯并不符合。2,2-二氯丙烷和1,1-二氯丙烷能脱去HCl,但1,1-二氯丁烷、戊烷和己烷则能部分水解,随后脱去HCl,生成E,E-, E,Z-和Z,Z-异构体二烷-1-烯基醚,并且得到了这些物质的13C NMR全归属数据。6-氯己-1-炔和7-氯庚-1-炔能发生环化反应生成亚甲基环烷烃和环炔烃。本文还考察了1,2-二溴环己烷和1,2-二氯环辛烷在上述条件下的行为。本文给出了众多种证据,表明这些反应过程不涉及气相自由基的形成,而是表面吸附的金属有机物种。
• PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
  申请人：SAN-APRO LTD.

  公开号：US20160368879A1

  公开（公告）日：2016-12-22

  Provided is a non-ionic photoacid generator (A) expressed by general formula (1). R1 and R2 each independently represents an alkyl group having 1-18 carbons or a fluoroalkyl group having 1-18 carbons, an alkenyl group having 2-18 carbons, an alkynyl group having 2-18 carbons, an aryl group having 6-18 carbons, a silyl group, or the like; m and n respectively represent the number of R1s and R2s, each number being an integer from 0 to 3, and the total number (m+n) of R1s and R2s being an integer from 1 to 6. The m number of R1s and the n number of R2s may each be the same or different. R3 represents a hydrocarbon having 1-18 carbons wherein one part or all of the hydrogen may be substituted by fluorine.

  提供的非离子光酸发生剂（A）由通式（1）表示。R1和R2分别独立表示具有1-18个碳原子的烷基基团或具有1-18个碳原子的氟烷基基团，具有2-18个碳原子的烯基基团，具有2-18个碳原子的炔基基团，具有6-18个碳原子的芳基基团，硅基团等；m和n分别表示R1和R2的数量，每个数字为0到3的整数，R1和R2的总数（m+n）为1到6的整数。R1的数量m和R2的数量n可以相同也可以不同。R3表示具有1-18个碳原子的碳氢化合物，其中氢的一部分或全部可以被氟取代。
• ION-ACTIVATED PHOTOLABILE COMPOUNDS
  申请人：HOWARD HUGHES MEDICAL INSTITUTE

  公开号：US20180251441A1

  公开（公告）日：2018-09-06

  The presently-disclosed subject matter relates to analyte-activated photolabile compounds. The compounds include the formula: wherein Z includes a maskable molecule; L is selected from a bond, C, C(O), O, alkyl, (O)alkyl, and alkoxy; R 1 is selected from H, halogen, alkyl, and acyl; each R 2 is independently selected from H, alkyl, aryl, and acyl, and is optionally substituted with one or more heteroatoms independently selected from COOH and COO(alkyl); and R 3 is selected from H, alkyl, aryl, halogen, CN, OH, O(alkyl), O(aryl), SH, S(alkyl), S(aryl), amine, CHO, COOH, COO(alkyl), COO(aryl), PO 3 H 2 , and SO 3 H, and is optionally substituted with one or more heteroatoms independently selected from N, O, and S, halogen, OH, O(alkyl), O(aryl), SH, S(alkyl), S(aryl), amine, NO 2 , CHO, COO, COOH, COO(alkyl), COO(aryl), C(O)NR 2 , PO 3 H 2 , and/or SO 3 H. Also provided are methods of detecting calcium and treating a subject with the analyte-activated photolabile compounds.

  目前披露的主题事项涉及分析物激活的光敏化合物。这些化合物包括以下公式：其中Z包括可掩蔽的分子；L选自键、C、C(O)、O、烷基、(O)烷基和烷氧基；R1选自H、卤素、烷基和酰基；每个R2独立选自H、烷基、芳基和酰基，并且可以选择性地用独立选自COOH和COO(烷基)的一个或多个杂原子替换；R3选自H、烷基、芳基、卤素、CN、OH、O(烷基)、O(芳基)、SH、S(烷基)、S(芳基)、胺、CHO、COOH、COO(烷基)、COO(芳基)、PO3H2和SO3H，并且可以选择性地用独立选自N、O、S、卤素、OH、O(烷基)、O(芳基)、SH、S(烷基)、S(芳基)、胺、NO2、CHO、COO、COOH、COO(烷基)、COO(芳基)、C(O)NR2、PO3H2和/或SO3H的一个或多个杂原子替换。还提供了检测钙和处理主体与该分析物激活的光敏化合物的方法。
• [EN] ION-ACTIVATED PHOTOLABILE COMPOUNDS<br/>[FR] COMPOSÉS PHOTOLABILES ACTIVÉS PAR IONS
  申请人：HUGHES HOWARD MED INST

  公开号：WO2017040805A1

  公开（公告）日：2017-03-09

  The presently-disclosed subject matter relates to analyte-activated photolabile compounds. The compounds include the formula: wherein Z includes a maskable molecule; L is selected from a bond, C, C(O), O, alkyl, (O)alkyl, and alkoxy; R1 is selected from H, halogen, alkyl, and acyl; each R2 is independently selected from H, alkyl, aryl, and acyl, and is optionally substituted with one or more heteroatoms independently selected from COOH and COO(alkyl); and R3 is selected from H, alkyl, aryl, halogen, CN, OH, O(alkyl), O(aryl), SH, S(alkyl), S(aryl), amine, CHO, COOH, COO(alkyl), COO(aryl), PO3H2, and SO3H, and is optionally substituted with one or more heteroatoms independently selected from N, O, and S, halogen, OH, O(alkyl), O(aryl), SH, S(alkyl), S(aryl), amine, NO2, CHO, COO, COOH, COO(alkyl), COO(aryl), C(O)NR2, PO3H2, and/or SO3H. Also provided are methods of detecting calcium and treating a subject with the analyte-activated photolabile compounds.

  目前披露的主题事项涉及分析物激活的光敏化合物。这些化合物包括以下公式：其中Z包括可屏蔽分子；L选自键、C、C(O)、O、烷基、(O)烷基和烷氧基；R1选自H、卤素、烷基和酰基；每个R2独立选自H、烷基、芳基和酰基，并且可以选择性地用独立选自COOH和COO(烷基)的一个或多个杂原子取代；R3选自H、烷基、芳基、卤素、CN、OH、O(烷基)、O(芳基)、SH、S(烷基)、S(芳基)、胺、CHO、COOH、COO(烷基)、COO(芳基)、PO3H2和SO3H，并且可以选择性地用独立选自N、O和S、卤素、OH、O(烷基)、O(芳基)、SH、S(烷基)、S(芳基)、胺、NO2、CHO、COO、COOH、COO(烷基)、COO(芳基)、C(O)NR2、PO3H2和/或SO3H的一个或多个杂原子取代。还提供了检测钙和用分析物激活的光敏化合物治疗主体的方法。
• COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：US20200249573A1

  公开（公告）日：2020-08-06

  The present invention provides a composition for resist underlayer film formation comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种用于抗蚀底层膜形成的组合物，其包括含碲化合物或含碲树脂。