Photosensitive copolymers of alkyl vinyl ether and resist compositions containing the same
申请人:SAMSUNG ELECTRONICS CO. LTD.
公开号:EP1120689A2
公开(公告)日:2001-08-01
There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure:
wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures
wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.
本发明提供了一种具有烷基乙烯基醚共聚物的光敏聚合物和含有该聚合物的抗蚀剂组合物。光敏聚合物包括烷基乙烯基醚和马来酸酐的共聚物,其结构如下:
其中 X 是线性烷基乙烯基醚和环状烷基乙烯基醚中的一种,它们分别由以下结构表示
其中 y 为 1 至 4 的整数值之一,R1 为氢原子和甲基之一,R2 为 C1 至 C20 碳氢化合物,R3 为氢原子、C1 至 C3 烷基和烷氧基之一。