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2-ethoxy-Δ3,5-dihydropyran | 13687-95-1

中文名称
——
中文别名
——
英文名称
2-ethoxy-Δ3,5-dihydropyran
英文别名
2-ethoxy-5,6-dihydro-2H-pyran;6-ethoxy-3,6-dihydro-2H-pyran;6-Aethoxy-3,6-dihydro-2H-pyran;2-Ethoxy-Δ3-dihydro-pyran;2-Ethoxy-Δ3-dihydropyran;2-Aethoxy-5,6-dihydro-1,2-pyran;6-ethoxy-3,6-dihydro-2H-pyran
2-ethoxy-Δ<sup>3,5</sup>-dihydropyran化学式
CAS
13687-95-1
化学式
C7H12O2
mdl
——
分子量
128.171
InChiKey
QPSCQKRZWLJYDG-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    154-158 °C
  • 密度:
    0.982 g/cm3(Temp: 413 °C)

计算性质

  • 辛醇/水分配系数(LogP):
    1.1
  • 重原子数:
    9
  • 可旋转键数:
    2
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.71
  • 拓扑面积:
    18.5
  • 氢给体数:
    0
  • 氢受体数:
    2

SDS

SDS:8d9514d9c093c44a403eccb647603958
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反应信息

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文献信息

  • Photosensitive copolymers of alkyl vinyl ether and resist compositions containing the same
    申请人:SAMSUNG ELECTRONICS CO. LTD.
    公开号:EP1120689A2
    公开(公告)日:2001-08-01
    There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.
    本发明提供了一种具有烷基乙烯基醚共聚物的光敏聚合物和含有该聚合物的抗蚀剂组合物。光敏聚合物包括烷基乙烯基醚和马来酸酐的共聚物,其结构如下: 其中 X 是线性烷基乙烯基醚和环状烷基乙烯基醚中的一种,它们分别由以下结构表示 其中 y 为 1 至 4 的整数值之一,R1 为氢原子和甲基之一,R2 为 C1 至 C20 碳氢化合物,R3 为氢原子、C1 至 C3 烷基和烷氧基之一。
  • Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same
    申请人:SAMSUNG ELECTRONIC CO. LTD.
    公开号:EP1830229A2
    公开(公告)日:2007-09-05
    There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.
    本发明提供了一种具有烷基乙烯基醚共聚物的光敏聚合物和含有该聚合物的抗蚀剂组合物。光敏聚合物包括烷基乙烯基醚和马来酸酐的共聚物,其结构如下: 其中 X 是线型烷基乙烯基醚和环型烷基乙烯基醚中的一种,它们分别由以下结构表示 其中 y 为 1 至 4 的整数值之一,R1 为氢原子和甲基之一,R2 为 C1 至 C20 碳氢化合物,R3 为氢原子、C1 至 C3 烷基和烷氧基之一。
  • Dihydropyran as a Template for Lactone Synthesis
    作者:Matthew P. Brichacek、Robert M. Carlson
    DOI:10.1080/00397910701557358
    日期:2007.10.1
    3,4-Dihydro-2H-pyran (DHP) was efficiently transformed into 4-thiophenyl-3,4-dihydro-2H-pyran. This intermediate was converted to the corresponding 1,3-O,Sallylic carbanion with t-butyllithium and selectively alkylated at the carbon a to the sulfur with alkyl halides, an epoxide, and an aldehyde. An one-pot oxidative elimination of the sulfur fragment using vanadium pentoxide generates the desired beta-substituted alpha,beta-unsaturated delta-unsaturated-valero lactone.
  • Experimental studies of the anomeric effect. part III. Rotameric preferences about the exo-cyclic c2-x bond in equatorial and axial 2-methoxy- and 2-methylamino-tetrahydropyrans.
    作者:Harold Booth、J. Mark Dixon、Khedhair A. Khedhair、Simon A. Readshaw
    DOI:10.1016/s0040-4020(01)81971-2
    日期:1990.1
  • Quelet,R.; d'Angelo,J., Bulletin de la Societe Chimique de France, 1967, p. 3390 - 3395
    作者:Quelet,R.、d'Angelo,J.
    DOI:——
    日期:——
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