Additive for electrolyte of lithium battery, organic electrolytic solution comprising the same, and lithium battery using the organic electrolytic solution
STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION
申请人:Lee Wai Mun
公开号:US20090112024A1
公开(公告)日:2009-04-30
The invention relates to the use of amidoximes for prevention of or stabilization of hydroxylamine compounds against undesired decomposition.
本发明涉及将酰胺肟用于预防或稳定羟基胺化合物,防止其不受控分解。
NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION
申请人:Lee Wai Mun
公开号:US20090111965A1
公开(公告)日:2009-04-30
The present application relates to semiconductor processing compositions comprising at least one compound containing at least one amidoxime functional group and to methods of using these compositions in semiconductor processing. The present application also describes the preparation of amidoximes for a semiconductor processing composition by (a) mixing a cyanoethylation catalyst, a nucleophile and an alpha-unsaturated nitrile to produce a cyanoethylation product; and (b) converting a cyano group in the cyanoethylation product into an amidoxime functional group.
Bis(aminopropyl) arylacetonitriles and preparation thereof
申请人:Bayer Aktiengesellschaft
公开号:US04107200A1
公开(公告)日:1978-08-15
This invention relates to new aliphatic diamines containing cyanide groups, a process for their preparation by hydrogenation of the corresponding trinitriles and their use as chain lengthening agents in the isocyanate polyaddition process.
METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS
申请人:Lee Wai Mun
公开号:US20100043823A1
公开(公告)日:2010-02-25
The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or more other acid compounds, one or more basic compounds, and a fluoride-containing compound and additional components such as organic solvents, chelating agents, amines, and surfactants. The invention also relates to a method of removing residue from a substrate during integrated circuit fabrication.
The present invention is a novel aqueous cleaning solution for use in semiconductor front end of the line (FEOL) manufacturing process wherein the cleaning solution comprises at least one amidoxime compound.