This invention relates to a polymer capable of forming an ultra-fine pattern with excellent rectangular shape in a silylated surface resolution process using a chemically amplified type resist composition as single layer or the most upper layer among multiple layers and to a resist composition using the polymer.
The said polymer and resist composition are useful in a silylated surface resolution process, and by conducting the silylated surface resolution process using the said resist composition, contrast of silylation becomes higher and it becomes possible to obtain ultra-fine pattern regardless of the kind of exposure energy.
本发明涉及一种聚合物,能够在使用
化学增感型抗蚀剂组成的单层或多层中的最上层作为
硅化表面分辨率过程中形成具有优异矩形形状的超细图案,并涉及使用该聚合物的抗蚀剂组成物。该聚合物和抗蚀剂组成物在
硅化表面分辨率过程中非常有用,通过使用该抗蚀剂组成物进行
硅化表面分辨率过程,
硅化对比度更高,无论曝光能量的种类如何,都可以获得超细图案。