2-(1-Ethoxyethoxy)-ethylmethacrylat | 28292-92-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-(1-Ethoxyethoxy)-ethylmethacrylat
• 英文别名: 2-(1-ethoxyethoxy)ethyl methacrylate；2-(1-Ethoxyethoxy)ethyl 2-methylprop-2-enoate
• CAS: 28292-92-4
• 化学式: C₁₀H₁₈O₄
• 分子量: 202.251
• InChiKey: WGPZTLIWMRFXSI-UHFFFAOYSA-N

物化性质

• 沸点：
  60-90 °C(Press: 0.05 Torr)
• 密度：
  0.986±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  14
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.7
• 拓扑面积：
  44.8
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  吩噻嗪 、 乙烯基乙醚 在 盐酸 、 氢氧化钾 、 potassium carbonate 作用下， 以 甲基丙烯酸羟乙酯 为溶剂， 以91%的产率得到2-(1-Ethoxyethoxy)-ethylmethacrylat
  参考文献：
  名称：

  Anionic living polymers, their derivatives and composition comprising them

  摘要：

  公开号：

  EP0465835B1

文献信息

• Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：EP2472324A1

  公开（公告）日：2012-07-04

  Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

  提供了含有缩醛基团的(甲基)丙烯酸酯单体，含有由这种单体形成的单元的聚合物和含有这种聚合物的光阻组成物。这些单体、聚合物和光阻组成物在形成光刻图案方面非常有用。此外，还提供了用光阻组成物涂覆的基板、形成光刻图案的方法和电子设备。这些组成物、方法和涂覆的基板在制造半导体器件方面具有特殊的适用性。
• MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS
  申请人：Ober Matthias S.

  公开号：US20130011783A1

  公开（公告）日：2013-01-10

  Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

  提供含有缩醛基团的（甲基）丙烯酸酯单体，包含由这种单体形成的单元的聚合物，以及含有这种聚合物的光刻胶组合物。这些单体、聚合物和光刻胶组合物可用于形成光刻图案。还提供了涂有光刻胶组合物的基板、形成光刻图案的方法和电子设备。这些组合物、方法和涂层基板在半导体器件制造中具有特定的适用性。
• POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS
  申请人：BAE Young Cheol

  公开号：US20120288794A1

  公开（公告）日：2012-11-15

  Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

  提供了含有特定缩醛基团单元的聚合物和含有这种聚合物的光阻组合物。还提供了用光阻组合物涂覆的衬底和形成光刻图案的方法。这些聚合物、光阻组合物、方法和涂覆的衬底在半导体器件制造中具有特定的适用性。
• Tough flexible polymer blends
  申请人：E.I. DU PONT DE NEMOURS AND COMPANY

  公开号：EP0243120A2

  公开（公告）日：1987-10-28

  A blend of a softer continuous phase polymer reinforced with harder acrylic star polymer particles having reactive functional groups with crosslinking ability built in or provided by a third polymer. The harder polymer has a Tg at least 10°C above that of the softer polymer, and the acrylic star polymer is preferably made by group transfer polymerization. This blend provides coating compositions, films and bulk polymer with enhanced toughness and flexibility.

  一种较软的连续相聚合物与较硬的丙烯酸星型聚合物颗粒的混合物，后者具有活性官能团，内含或由第三种聚合物提供交联能力。 较硬的聚合物的 Tg 至少比较软的聚合物高 10°C，丙烯酸星型聚合物最好通过基团转移聚合制成。 这种混合物可提供韧性和柔韧性更强的涂料组合物、薄膜和散装聚合物。
• 1,4 -O- metallation process and composition
  申请人：E.I. DU PONT DE NEMOURS AND COMPANY

  公开号：EP0355224A1

  公开（公告）日：1990-02-28

  This invention resides in a process for production of predominantly a 1,4-O-metallation product of a hydride of silicon, germanium, or tin with an α,β-unsaturated carbonyl compound. The reaction involved takes place in the presence of a heterogeneous noncomplexed rhodium-containing catalyst. This invention also resides in 1,4-O-metallation compositions having perfluoroalkyl R groups on either side of the C=C bond of an enol ether or on the acetal side of the C=C bond of a ketene acetal.

  本发明涉及一种主要生产硅、锗或锡的氢化物与α，β-不饱和羰基化合物的 1，4-O-金属化产物的工艺。该反应是在含铑的非络合异相催化剂存在下进行的。本发明还涉及在烯醇醚的 C=C 键两侧或烯酮缩醛的 C=C 键的缩醛侧具有全氟烷基 R 基团的 1,4-O-金属化组合物。