申请人:HOFFMANN LA ROCHE
公开号:WO2001055120A1
公开(公告)日:2001-08-02
The present invention provides a process for preparing 1, 2-diheteroethylene sulfonamide of the formula (i) by reacting a pyrimidine monohalide of the formula (ii) with a mono-protected 1, 2-diheteroethylene anion of the formula M1XCH2CH2YR5 and removing the protecting group, wherein R1 is hydrogen, lower alkyl, lower alkoxy, lower alkylthio, halogen or trifluoromethyl; R2 is hydrogen, halogen, lower alkoxy, trifluoromethyl or OCH2COORa; and R3 is hydrogen, halogen, lower alkyl, lower alkylthio, trifluoromethyl, cycloalkyl, lower alkoxy, or trifluoromethoxy; or R2 and R3 together can be butadienyl, methylenedioxy, ethylenedioxy or isopropylidenedioxy; R4 is hydrogen, lower alkyl, cycloalkyl, trifluoromethyl, lower alkoxy, lower alkylthio, lower alkylthio-lower alkyl, hydroxy-lower alkyl, hydroxy-lower alkoxy, lower alkoxy-lower alkyl, hydroxy-lower alkoxy-lower alkyl, hydroxy-lower alkoxy-lower alkoxy, lower alkylsulfinyl, lower alkylsulfonyl, 2-methoxy-3-hydroxypropoxy, 2-hydroxy-3-phenylpropyl, amino-lower alkyl, lower alkylamino-lower alkyl, di-lower alkylamino-lower alkyl, amino, lower alkylamino, di-lower alkylamino, arylamino, aryl, arylthio, aryloxy, aryl-lower alkyl or heterocyclyl; R5 is a protecting group; R6, R7, R8 and R9 are independently hydrogen, halogen, lower alkyl, trifluoromethyl, lower alkoxy, lower alkylthio, hydroxy, hydroxymethyl, cyano, carboxyl, formyl, methylsulfinyl, methylsulfonyl, methylsulfonyloxy or lower alkyloxy-carbonyloxy; or R7 together with R6 or R8 can be butadienyl, methylenedioxy, ethylenedioxy or isopropylidenedioxy; Z is O, S, ethylene, vinylene, C(=O), OCHR10, or SCHR10; R10 is hydrogen or lower alkyl; X and Y are independently O, S, or NH; M is hydrogen, an alkaline metal or an alkaline earth metal; M1 is an alkaline metal or an alkaline earth metal; and W is a halide.
本发明提供了一种制备式(i)的1,2-二杂
乙烯磺
酰胺的方法,该方法通过将式(ii)的
嘧啶单卤代物与式M1XCH2CH2YR5的单保护1,2-二杂
乙烯负离子反应,并去除保护基,其中R1是
氢、低
碳基、低
氧基、低
硫基、卤素或三
氟甲基;R2是
氢、卤素、低
氧基、三
氟甲基或OCH2COORa;R3是
氢、卤素、低
碳基、低
硫基、三
氟甲基、
环烷基、低
氧基或三
氟甲
氧基;或R2和R3可以共同为
丁二烯基、亚甲二
氧基、乙二
氧基或
异丙基亚
甲基二
氧基;R4是
氢、低
碳基、
环烷基、三
氟甲基、低
氧基、低
硫基-低
碳基、羟基-低
碳基、羟基-低
氧基、低
氧基-低
碳基、羟基-低
氧基-低
碳基、羟基-低
氧基-低
氧基、低
碳基
亚砜基、低
碳基磺酰基、
2-甲氧基-3-羟基丙
氧基、2-羟基-3-
苯基丙基、
氨基-低
碳基、低
碳基
氨基-低
碳基、二-低
碳基
氨基-低
碳基、
氨基、低
碳基
氨基、二-低
碳基
氨基、芳基
氨基、芳基、芳基
硫、芳基
氧、芳基-低
碳基或杂环基;R5是保护基;R6、R7、R8和R9分别是
氢、卤素、低
碳基、三
氟甲基、低
氧基、低
硫基、羟基、
羟甲基、
氰基、羧基、甲酰基、甲
硫氧基基、甲磺酰基、
甲磺酰氧基或低
碳基
氧基-
羧酸酯基;或R7与R6或R8可以共同为
丁二烯基、亚甲二
氧基、乙二
氧基或
异丙基亚
甲基二
氧基;Z是O、S、
乙烯、
乙烯基、C(=O)、OCHR10或SCHR10;R10是
氢或低
碳基;X和Y分别是O、S或NH;M是
氢、碱
金属或碱土
金属;M1是碱
金属或碱土
金属;W是卤素。